P

Inventor

YU JENG-WEI

TW21 patents
⚠️ This page may combine multiple inventors who share the name “YU JENG-WEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

15 patents
US11101347B2Aug 24, 2021

Confined source/drain epitaxy regions and method forming same

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations83
US11948971B2Apr 2, 2024

Confined source/drain epitaxy regions and method forming same

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations74
US11037826B2Jun 15, 2021

Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10879128B2Dec 29, 2020

Semiconductor device and method of forming same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10546784B2Jan 28, 2020

Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US12389649B2Aug 12, 2025

Transistors with stacked semiconductor layers as channels

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12363993B2Jul 15, 2025

Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12068395B2Aug 20, 2024

Method for forming an undoped region under a source/drain

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11908742B2Feb 20, 2024

Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11257908B2Feb 22, 2022

Transistors with stacked semiconductor layers as channels

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12057450B2Aug 6, 2024

Epitaxy regions with large landing areas for contact plugs

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11652105B2May 16, 2023

Epitaxy regions with large landing areas for contact plugs

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12094778B2Sep 17, 2024

Fin field-effect transistor device and method of forming

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10049936B2Aug 14, 2018

Semiconductor device having merged epitaxial features with Arc-like bottom surface and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12439657B2Oct 7, 2025

Confined source/drain epitaxy regions and method forming same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51

OPTO TECH CORP

3 patents

PENG LUNG-HAN

2 patents

LIN CHEN-YEN

1 patent