Inventor
YU JENG-WEI
TW21 patents
⚠️ This page may combine multiple inventors who share the name “YU JENG-WEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
15 patentsUS11101347B2Aug 24, 2021
Confined source/drain epitaxy regions and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations83
US11948971B2Apr 2, 2024
Confined source/drain epitaxy regions and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations74
US11037826B2Jun 15, 2021
Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10879128B2Dec 29, 2020
Semiconductor device and method of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10546784B2Jan 28, 2020
Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US12389649B2Aug 12, 2025
Transistors with stacked semiconductor layers as channels
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12363993B2Jul 15, 2025
Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12068395B2Aug 20, 2024
Method for forming an undoped region under a source/drain
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11908742B2Feb 20, 2024
Semiconductor device having merged epitaxial features with arc-like bottom surface and method of making the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11257908B2Feb 22, 2022
Transistors with stacked semiconductor layers as channels
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12057450B2Aug 6, 2024
Epitaxy regions with large landing areas for contact plugs
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11652105B2May 16, 2023
Epitaxy regions with large landing areas for contact plugs
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12094778B2Sep 17, 2024
Fin field-effect transistor device and method of forming
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10049936B2Aug 14, 2018
Semiconductor device having merged epitaxial features with Arc-like bottom surface and method of making the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12439657B2Oct 7, 2025
Confined source/drain epitaxy regions and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
OPTO TECH CORP
3 patentsUS8809832B1Aug 19, 2014
Method of selective photo-enhanced wet oxidation for nitride layer regrowth on substrates and associated structure
OPTO TECH CORP4 citations72
US8871546B2Oct 28, 2014
Method of selective photo-enhanced wet oxidation for nitride layer regrowth on substrates and associated structure
OPTO TECH CORP0 citations51
US8679883B2Mar 25, 2014
Method of separating nitride films from growth substrates by selective photo-enhanced wet oxidation and associated semiconductor structure
OPTO TECH CORP0 citations51