P

Inventor

LEE WEI-CHIN

TW24 patents
⚠️ This page may combine multiple inventors who share the name “LEE WEI-CHIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

21 patents
US10304835B1May 28, 2019

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD33 citations97
US10504789B1Dec 10, 2019

Pre-deposition treatment for FET technology and devices formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US11532509B2Dec 20, 2022

Selective hybrid capping layer for metal gates of transistors

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11502080B2Nov 15, 2022

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11121041B2Sep 14, 2021

Methods for threshold voltage tuning and structure formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10868013B2Dec 15, 2020

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10692770B2Jun 23, 2020

Geometry for threshold voltage tuning on semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10510756B1Dec 17, 2019

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10510621B2Dec 17, 2019

Methods for threshold voltage tuning and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations73
US11610982B2Mar 21, 2023

Void elimination for gap-filling in high-aspect ratio trenches

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12183629B2Dec 31, 2024

Selective hybrid capping layer for metal gates of transistors

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12087637B2Sep 10, 2024

Semiconductor device and method of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11935957B2Mar 19, 2024

Geometry for threshold voltage tuning on semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11855098B2Dec 26, 2023

Semiconductor devices having dipole-inducing elements

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11094828B2Aug 17, 2021

Geometry for threshold voltage tuning on semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10867864B2Dec 15, 2020

Semiconductor device and method of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12142531B2Nov 12, 2024

Pre-deposition treatment for FET technology and devices formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11322411B2May 3, 2022

Pre-deposition treatment for FET technology and devices formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11302582B2Apr 12, 2022

Pre-deposition treatment for FET technology and devices formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12100751B2Sep 24, 2024

Void elimination for gap-filling in high-aspect ratio trenches

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12431356B2Sep 30, 2025

Metal gate structure and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59

UNIV TSINGHUA

2 patents

HON HAI PREC IND CO LTD

1 patent