P

Inventor

OMURA YASUHIRO

85 patents
⚠️ This page may combine multiple inventors who share the name “OMURA YASUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIKON CORP

45 patents
US6195213B1Feb 27, 2001

Projection exposure apparatus and method

NIKON CORP143 citations99
US5835275ANov 10, 1998

Catadioptric system for photolithography

NIKON CORP292 citations99
US6750948B2Jun 15, 2004

Projection optical system, projection exposure apparatus having the projection optical system, projection method thereof, exposure method thereof and fabricating method for fabricating a device using the projection exposure apparatus

NIKON CORP107 citations98
US6473243B1Oct 29, 2002

Catadioptric imaging system and a projection exposure apparatus provided with said imaging system

NIKON CORP85 citations98
US6757051B2Jun 29, 2004

Projection optical system, manufacturing method thereof, and projection exposure apparatus

NIKON CORP101 citations97
US7580197B2Aug 25, 2009

Projection optical system and method for photolithography and exposure apparatus and method using same

NIKON CORP34 citations96
US7362508B2Apr 22, 2008

Projection optical system and method for photolithography and exposure apparatus and method using same

NIKON CORP46 citations96
US7348575B2Mar 25, 2008

Projection optical system, exposure apparatus, and exposure method

NIKON CORP46 citations96
US7312463B2Dec 25, 2007

Projection optical system, exposure apparatus, and exposure method

NIKON CORP33 citations96
US7309870B2Dec 18, 2007

Projection optical system, exposure apparatus, and exposure method

NIKON CORP35 citations96
US6909492B2Jun 21, 2005

Projection optical system, exposure apparatus and exposure method

NIKON CORP57 citations96
US6674513B2Jan 6, 2004

Projection exposure methods and apparatus, and projection optical systems

NIKON CORP48 citations96
US6661499B2Dec 9, 2003

Projection exposure apparatus with a catadioptric projection optical system

NIKON CORP64 citations96
US6639734B2Oct 28, 2003

Catadioptric imaging system and a projection exposure apparatus provided with said imaging system

NIKON CORP46 citations96
US6512641B2Jan 28, 2003

Projection exposure apparatus and method

NIKON CORP53 citations96
US6466303B1Oct 15, 2002

Projection exposure apparatus with a catadioptric projection optical system

NIKON CORP76 citations96
US6451507B1Sep 17, 2002

Exposure apparatus and method

NIKON CORP55 citations96
US5805357ASep 8, 1998

Catadioptric system for photolithography

NIKON CORP56 citations96
US6903803B2Jun 7, 2005

Projection optical system, exposure apparatus incorporating this projection optical system, and manufacturing method for micro devices using the exposure apparatus

NIKON CORP20 citations93
US6864961B2Mar 8, 2005

Projection exposure methods and apparatus, and projection optical systems

NIKON CORP32 citations93
US6844982B2Jan 18, 2005

Projection optical system, exposure system provided with the projection optical system, and exposure method using the projection optical system

NIKON CORP36 citations93
US6606144B1Aug 12, 2003

Projection exposure methods and apparatus, and projection optical systems

NIKON CORP54 citations93
US6556353B2Apr 29, 2003

Projection optical system, projection exposure apparatus, and projection exposure method

NIKON CORP43 citations93
US6362926B1Mar 26, 2002

Projection exposure apparatus and method

NIKON CORP21 citations93
US6081382AJun 27, 2000

Catadioptric reduction projection optical system

NIKON CORP51 citations93
US6069749AMay 30, 2000

Catadioptric reduction optical system

NIKON CORP22 citations93
US5835284ANov 10, 1998

Catadioptric optical system and adjusting method

NIKON CORP31 citations93
US7688517B2Mar 30, 2010

Projection optical system and method for photolithography and exposure apparatus and method using same

NIKON CORP12 citations92
US7619827B2Nov 17, 2009

Projection optical system and method for photolithography and exposure apparatus and method using same

NIKON CORP10 citations92
US7609455B2Oct 27, 2009

Projection optical system and method for photolithography and exposure apparatus and method using same

NIKON CORP10 citations92
US6831731B2Dec 14, 2004

Projection optical system and an exposure apparatus with the projection optical system

NIKON CORP45 citations92
US6788389B2Sep 7, 2004

Production method of projection optical system

NIKON CORP47 citations91
US7701640B2Apr 20, 2010

Projection optical system and method for photolithography and exposure apparatus and method using same

NIKON CORP8 citations84
US7551362B2Jun 23, 2009

Projection optical system and method for photolithography and exposure apparatus and method using same

NIKON CORP8 citations84
US6208473B1Mar 27, 2001

Catadioptric projection lens

NIKON CORP19 citations84
US9360763B2Jun 7, 2016

Projection optical system, exposure apparatus, and exposure method

NIKON CORP4 citations83
US6452723B1Sep 17, 2002

Exposure apparatus and method

NIKON CORP10 citations82
US6844915B2Jan 18, 2005

Optical system and exposure apparatus provided with the optical system

NIKON CORP10 citations74
US6714280B2Mar 30, 2004

Projection optical system, projection exposure apparatus, and projection exposure method

NIKON CORP8 citations74
US6707601B2Mar 16, 2004

Exposure apparatus and method

NIKON CORP4 citations74
US6646797B2Nov 11, 2003

Exposure apparatus and method

NIKON CORP6 citations74
US6104542AAug 15, 2000

Wide-angle eyepiece lens with large eye relief

NIKON CORP12 citations74
US5877900AMar 2, 1999

Eyepiece with wide field of view

NIKON CORP8 citations74
US5815317ASep 29, 1998

Eyepiece with broad visibility

NIKON CORP11 citations74
US6639732B2Oct 28, 2003

Projection exposure apparatus and method

NIKON CORP9 citations73

OMURA YASUHIRO

3 patents

ISHIKAWAJIMA HARIMA HEAVY IND

2 patents

Showing the top 50 of 85 patents by PatentIndex Score.