Inventor
DAMMEL RALPH
DE33 patents
⚠️ This page may combine multiple inventors who share the name “DAMMEL RALPH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST AG
18 patentsUS5403697AApr 4, 1995
Positive radiation-sensitive mixture and recording material produced therefrom
HOECHST AG21 citations92
US5340682AAug 23, 1994
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound
HOECHST AG29 citations92
US5338641AAug 16, 1994
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound
HOECHST AG39 citations92
US5424166AJun 13, 1995
Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom
HOECHST AG21 citations91
US5326826AJul 5, 1994
Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation
HOECHST AG16 citations74
US5286602AFeb 15, 1994
Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture
HOECHST AG8 citations74
US5217843AJun 8, 1993
Positive radiation-sensitive mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation
HOECHST AG7 citations74
US4946759AAug 7, 1990
Positive radiation-sensitive mixture and radiation-sensitive recording material produced therefrom
HOECHST AG9 citations74
US5234791AAug 10, 1993
Radiation-curable composition and radiation-sensitive recording material prepared therefrom for use with high-energy radiation
HOECHST AG13 citations73
US5198322AMar 30, 1993
Positively operating radiation-sensitive mixture containing a polyfunctional α-diazo-β-keto ester and radiation-sensitive recording material containing this mixture
HOECHST AG10 citations73
US5401608AMar 28, 1995
Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith
HOECHST AG17 citations72
US5346806ASep 13, 1994
Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture
HOECHST AG7 citations72
US5302488AApr 12, 1994
Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material
HOECHST AG6 citations63
US5256517AOct 26, 1993
Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having α-β-keto ester units and sulfonate units
HOECHST AG6 citations63
US5191069AMar 2, 1993
Polyfunctional compounds containing α-diazo-β-keto ester units and sulfonate units
HOECHST AG5 citations63
US5346804ASep 13, 1994
Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture
HOECHST AG6 citations58
US5614351AMar 25, 1997
Radiation-curable mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation
HOECHST AG1 citations52
US5247096ASep 21, 1993
Process for preparing n-tert-butoxycarbonylmaleimide
HOECHST AG1 citations52
HOECHST CELANESE CORP
5 patentsUS5342727AAug 30, 1994
Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition
HOECHST CELANESE CORP25 citations92
US4927956AMay 22, 1990
3,5-disubstituted-4-acetoxystyrene and process for its production
HOECHST CELANESE CORP21 citations81
US4933495AJun 12, 1990
Process for the production of 3-mono or 3,5 dihalogenated 4-acetoxystyrene, its polymerization, and hydrolysis
HOECHST CELANESE CORP9 citations74
US4868257ASep 19, 1989
Process for the production of 3-mono or 3,5 disubstituted-4-acetoxystyrene, its polymerization
HOECHST CELANESE CORP6 citations63
US5072025ADec 10, 1991
Process for the production of 3,5-disubstituted-4-acetoxystyrene
HOECHST CELANESE CORP3 citations62
HOECHST JAPAN
3 patentsUS5525453AJun 11, 1996
Positive-working radiation-sensitive mixture
HOECHST JAPAN61 citations94
US5843319ADec 1, 1998
Positive-working radiation-sensitive mixture
HOECHST JAPAN16 citations73
US5541036AJul 30, 1996
Negative photoresist compositions comprising a photosensitive compound, an alkoxymethylated melamine and novolak resin
HOECHST JAPAN17 citations73