P

Inventor

DAMMEL RALPH

DE33 patents
⚠️ This page may combine multiple inventors who share the name “DAMMEL RALPH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOECHST AG

18 patents
US5403697AApr 4, 1995

Positive radiation-sensitive mixture and recording material produced therefrom

HOECHST AG21 citations92
US5340682AAug 23, 1994

Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound

HOECHST AG29 citations92
US5338641AAug 16, 1994

Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound

HOECHST AG39 citations92
US5424166AJun 13, 1995

Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom

HOECHST AG21 citations91
US5326826AJul 5, 1994

Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation

HOECHST AG16 citations74
US5286602AFeb 15, 1994

Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture

HOECHST AG8 citations74
US5217843AJun 8, 1993

Positive radiation-sensitive mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation

HOECHST AG7 citations74
US4946759AAug 7, 1990

Positive radiation-sensitive mixture and radiation-sensitive recording material produced therefrom

HOECHST AG9 citations74
US5234791AAug 10, 1993

Radiation-curable composition and radiation-sensitive recording material prepared therefrom for use with high-energy radiation

HOECHST AG13 citations73
US5198322AMar 30, 1993

Positively operating radiation-sensitive mixture containing a polyfunctional α-diazo-β-keto ester and radiation-sensitive recording material containing this mixture

HOECHST AG10 citations73
US5401608AMar 28, 1995

Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith

HOECHST AG17 citations72
US5346806ASep 13, 1994

Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture

HOECHST AG7 citations72
US5302488AApr 12, 1994

Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material

HOECHST AG6 citations63
US5256517AOct 26, 1993

Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having α-β-keto ester units and sulfonate units

HOECHST AG6 citations63
US5191069AMar 2, 1993

Polyfunctional compounds containing α-diazo-β-keto ester units and sulfonate units

HOECHST AG5 citations63
US5346804ASep 13, 1994

Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture

HOECHST AG6 citations58
US5614351AMar 25, 1997

Radiation-curable mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation

HOECHST AG1 citations52
US5247096ASep 21, 1993

Process for preparing n-tert-butoxycarbonylmaleimide

HOECHST AG1 citations52

HOECHST CELANESE CORP

5 patents

HOECHST JAPAN

3 patents

YAO HUIRONG

1 patent

VICARI RICHARD

1 patent

HOECHST CELANESE

1 patent

CLARIANT FINANCE BVI LTD

1 patent

AZ ELECTRONIC MATERIALS USA

1 patent

CLARIANT GMBH

1 patent

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L

1 patent