Inventor
LINGNAU JUERGEN
DE33 patents
⚠️ This page may combine multiple inventors who share the name “LINGNAU JUERGEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST AG
18 patentsUS5403697AApr 4, 1995
Positive radiation-sensitive mixture and recording material produced therefrom
HOECHST AG21 citations92
US5340682AAug 23, 1994
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound
HOECHST AG29 citations92
US5338641AAug 16, 1994
Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound
HOECHST AG39 citations92
US5221595AJun 22, 1993
Photopolymerizable mixture and recording material prepared therefrom
HOECHST AG25 citations92
US5137799AAug 11, 1992
Electrically conductive resist material, a process for its preparation and its use
HOECHST AG38 citations92
US5217843AJun 8, 1993
Positive radiation-sensitive mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation
HOECHST AG7 citations74
US4946759AAug 7, 1990
Positive radiation-sensitive mixture and radiation-sensitive recording material produced therefrom
HOECHST AG9 citations74
US4668600AMay 26, 1987
Electrophotographic recording material containing an n-type conducting pigment
HOECHST AG12 citations74
US4652507AMar 24, 1987
Electrophotographic recording material having a photoconductive double layer and process for its manufacture
HOECHST AG8 citations74
US5234791AAug 10, 1993
Radiation-curable composition and radiation-sensitive recording material prepared therefrom for use with high-energy radiation
HOECHST AG13 citations73
US4780680AOct 25, 1988
Process for the continuous, contact-free measurement of layer thicknesses and apparatus for performing the process
HOECHST AG17 citations73
US5025097AJun 18, 1991
4-chlorooxazole derivatives and processes for their preparation and use
HOECHST AG3 citations63
US4869983ASep 26, 1989
Sulfonyl-containing styrene derivatives and their use in electrophotographic processes
HOECHST AG5 citations63
US4684594AAug 4, 1987
Electrophotographic process for preparing printing forms using alkaline decoater solution
HOECHST AG2 citations63
US5614351AMar 25, 1997
Radiation-curable mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation
HOECHST AG1 citations52
US4892799AJan 9, 1990
4-chlorooxazole derivatives and processes for their preparation and use
HOECHST AG0 citations52
US4654283AMar 31, 1987
Electrophotographic recording material having a photoconductive double layer, and process for its manufacture
HOECHST AG1 citations52
US4988606AJan 29, 1991
Negative-working radiation-sensitive mixture with polymer having 1,2,3-thiadiazole groups, and recording material produced therefrom
HOECHST AG0 citations47
TICONA GMBH
5 patentsUS7534922B2May 19, 2009
Processes for the manufacture of acetals
TICONA GMBH21 citations91
US7301055B2Nov 27, 2007
Process for removing methanol from formaldehyde-containing solutions
TICONA GMBH20 citations91
US7943726B2May 17, 2011
Process for preparation of oxymethylene polymers in a homogeneous phase, and use
TICONA GMBH15 citations84
US7812110B2Oct 12, 2010
Process for preparation of oxymethylene polymers, selected polymers, and their use
TICONA GMBH18 citations84
US8354495B2Jan 15, 2013
Process for the preparation of oxymethylene polymers and apparatus suitable for this purpose
TICONA GMBH1 citations46
HOECHST CELANESE CORP
4 patentsUS4927956AMay 22, 1990
3,5-disubstituted-4-acetoxystyrene and process for its production
HOECHST CELANESE CORP21 citations81
US4933495AJun 12, 1990
Process for the production of 3-mono or 3,5 dihalogenated 4-acetoxystyrene, its polymerization, and hydrolysis
HOECHST CELANESE CORP9 citations74
US4868257ASep 19, 1989
Process for the production of 3-mono or 3,5 disubstituted-4-acetoxystyrene, its polymerization
HOECHST CELANESE CORP6 citations63
US5072025ADec 10, 1991
Process for the production of 3,5-disubstituted-4-acetoxystyrene
HOECHST CELANESE CORP3 citations62