Inventor
NIINO REIJI
JP21 patents
⚠️ This page may combine multiple inventors who share the name “NIINO REIJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
19 patentsUS8778815B2Jul 15, 2014
Film forming method
TOKYO ELECTRON LTD72 citations98
US5637153AJun 10, 1997
Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus
TOKYO ELECTRON LTD351 citations98
US5380370AJan 10, 1995
Method of cleaning reaction tube
TOKYO ELECTRON LTD56 citations96
US5316472AMay 31, 1994
Vertical boat used for heat treatment of semiconductor wafer and vertical heat treatment apparatus
TOKYO ELECTRON LTD66 citations93
US5500388AMar 19, 1996
Heat treatment process for wafers
TOKYO ELECTRON LTD26 citations90
US7989354B2Aug 2, 2011
Patterning method
TOKYO ELECTRON LTD9 citations84
US10960435B2Mar 30, 2021
Film forming apparatus, film forming method, and storage medium
TOKYO ELECTRON LTD2 citations73
US10446438B2Oct 15, 2019
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD2 citations73
US8383522B2Feb 26, 2013
Micro pattern forming method
TOKYO ELECTRON LTD2 citations63
US7754622B2Jul 13, 2010
Patterning method utilizing SiBN and photolithography
TOKYO ELECTRON LTD2 citations63
US11056349B2Jul 6, 2021
Method of fabricating semiconductor device, vacuum processing apparatus and substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
US10593556B2Mar 17, 2020
Method of fabricating semiconductor device, vacuum processing apparatus and substrate processing apparatus
TOKYO ELECTRON LTD1 citations62
US10755971B2Aug 25, 2020
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations52
US10748782B2Aug 18, 2020
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations52
US10629448B2Apr 21, 2020
Method of manufacturing semiconductor device and vacuum processing apparatus
TOKYO ELECTRON LTD0 citations52
US10490405B2Nov 26, 2019
Semiconductor device manufacturing method, substrate processing apparatus and vacuum processing apparatus
TOKYO ELECTRON LTD0 citations52
US11136668B2Oct 5, 2021
Film-forming apparatus and film-forming method
TOKYO ELECTRON LTD0 citations51
US10790135B2Sep 29, 2020
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations51
US9162252B2Oct 20, 2015
Film forming method
TOKYO ELECTRON LTD0 citations42