Inventor
MIKATA YUUICHI
JP46 patents
⚠️ This page may combine multiple inventors who share the name “MIKATA YUUICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
39 patentsUS6713824B1Mar 30, 2004
Reliable semiconductor device and method of manufacturing the same
TOSHIBA KK527 citations98
US5234869AAug 10, 1993
Method of manufacturing silicon nitride film
TOSHIBA KK72 citations96
US6093243AJul 25, 2000
Semiconductor device and its fabricating method
TOSHIBA KK50 citations95
US5582640ADec 10, 1996
Semiconductor device and its fabricating method
TOSHIBA KK50 citations95
US4931405AJun 5, 1990
Method for manufacturing a semiconductor device and suppressing the generation of bulk microdefects near the substrate surface layer
TOSHIBA KK102 citations94
US6865513B2Mar 8, 2005
Method for predicting life of rotary machine and determining repair timing of rotary machine
TOSHIBA KK18 citations93
US6066872AMay 23, 2000
Semiconductor device and its fabricating method
TOSHIBA KK27 citations92
US5378652AJan 3, 1995
Method of making a through hole in multi-layer insulating films
TOSHIBA KK37 citations92
US5291058AMar 1, 1994
Semiconductor device silicon via fill formed in multiple dielectric layers
TOSHIBA KK26 citations92
US4597159AJul 1, 1986
Method of manufacturing SiO2 -Si interface for floating gate semiconductor device
TOSHIBA KK44 citations92
US6171977B1Jan 9, 2001
Semiconductor device applied to composite insulative film manufacturing method thereof
TOSHIBA KK17 citations91
US5238859AAug 24, 1993
Method of manufacturing semiconductor device
TOSHIBA KK39 citations91
US5237196AAug 17, 1993
Semiconductor device and method for manufacturing the same
TOSHIBA KK22 citations91
US5032535AJul 16, 1991
Method of manufacturing semiconductor device
TOSHIBA KK27 citations91
US6163050ADec 19, 2000
Semiconductor device having insulation film whose breakdown voltage is improved and its manufacturing method
TOSHIBA KK16 citations89
US6944572B2Sep 13, 2005
Apparatus for predicting life of rotary machine and equipment using the same
TOSHIBA KK15 citations84
US5561087AOct 1, 1996
Method of forming a uniform thin film by cooling wafers during CVD
TOSHIBA KK15 citations82
US5879447AMar 9, 1999
Semiconductor device and its fabricating method
TOSHIBA KK14 citations81
US7844433B2Nov 30, 2010
System, method and program for designing a utility facility and method for manufacturing a product by the utility facility
TOSHIBA KK8 citations79
US5714399AFeb 3, 1998
Semiconductor device having insulation film whose breakdown voltage is improved and its manufacturing method
TOSHIBA KK16 citations79
US5702531ADec 30, 1997
Apparatus for forming a thin film
TOSHIBA KK11 citations74
US5181088AJan 19, 1993
Vertical field effect transistor with an extended polysilicon channel region
TOSHIBA KK11 citations74
US5149666ASep 22, 1992
Method of manufacturing a semiconductor memory device having a floating gate electrode composed of 2-10 silicon grains
TOSHIBA KK9 citations74
US5031010AJul 9, 1991
Semiconductor memory device and method of manufacturing the same
TOSHIBA KK6 citations74
US4966866AOct 30, 1990
Method for manufacturing semiconductor device having gate electrodes of different conductivity types
TOSHIBA KK13 citations74
US6772045B2Aug 3, 2004
System for determining dry cleaning timing, method for determining dry cleaning timing, dry cleaning method, and method for manufacturing semiconductor device
TOSHIBA KK8 citations73
US5612236AMar 18, 1997
Method of forming a silicon semiconductor device using doping during deposition of polysilicon
TOSHIBA KK10 citations73
US5250463AOct 5, 1993
Method of making doped semiconductor film having uniform impurity concentration on semiconductor substrate
TOSHIBA KK6 citations73
US5838056ANov 17, 1998
Semiconductor device applied to composite insulative film and manufacturing method thereof
TOSHIBA KK7 citations72
US6983191B2Jan 3, 2006
Semiconductor manufacturing line availability evaluating system and design system
TOSHIBA KK5 citations63
US5766785AJun 16, 1998
Method and apparatus for manufacturing a semiconductor device
TOSHIBA KK3 citations63
US5702529ADec 30, 1997
Method of making doped semiconductor film having uniform impurity concentration on semiconductor substrate and apparatus for making the same
TOSHIBA KK3 citations62
US5286523AFeb 15, 1994
Method of processing substrates and substrate processing apparatus
TOSHIBA KK4 citations60
US4721991AJan 26, 1988
Refractory silicide conductor containing iron
TOSHIBA KK3 citations57
US7145667B2Dec 5, 2006
Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, semiconductor device manufacturing system, and cleaning method for semiconductor device manufacturing apparatus
TOSHIBA KK1 citations52
US6989281B2Jan 24, 2006
Cleaning method for a semiconductor device manufacturing apparatus
TOSHIBA KK0 citations52
US6867054B2Mar 15, 2005
Method of manufacturing a semiconductor device
TOSHIBA KK0 citations52
US6329303B1Dec 11, 2001
Thin film forming method, thin film forming apparatus and method for manufacturing semiconductor device
TOSHIBA KK1 citations52
US6929991B2Aug 16, 2005
Reliable semiconductor device and method of manufacturing the same
TOSHIBA KK0 citations51
TOKYO ELECTRON LTD
4 patentsUS5637153AJun 10, 1997
Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus
TOKYO ELECTRON LTD351 citations98
US5380370AJan 10, 1995
Method of cleaning reaction tube
TOKYO ELECTRON LTD56 citations96
US5316472AMay 31, 1994
Vertical boat used for heat treatment of semiconductor wafer and vertical heat treatment apparatus
TOKYO ELECTRON LTD66 citations93
US5370371ADec 6, 1994
Heat treatment apparatus
TOKYO ELECTRON LTD30 citations92