Inventor

BRUNNER TIMOTHY A

US48 patents

⚠️ This page may combine multiple inventors who share the name “BRUNNER TIMOTHY A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BRUNNER TIMOTHY A

IBM

Optical metrology tool and method of using same

Optical metrology tool and method of using same

Process for controlling etching parameters

Process for controlling exposure dose or focus parameters using tone reversing pattern

Optically measurable serpentine edge tone reversed targets

Measurement method for linewidth metrology

High performance multi-mesa field effect transistor

Focus or exposure dose parameter control system using tone reversing patterns

Simplified fabrication methods for rim phase-shift masks

Etching parameter control system process

Optical focus phase shift test pattern, monitoring system and process

Method of improving grating test pattern for lithography monitoring and controlling

Single tone process window metrology target and method for lithographic processing

Phase shifted test pattern for monitoring focus and aberrations in optical projection systems

Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures

Fresnel zone mask for pupilgram

Phase shift mask using liquid phase oxide deposition

Mask that provides improved focus control using orthogonal edges

Method for producing self-aligned mask, articles produced by same and composition for same

Focus blur measurement and control method

Wafer stress control and topography compensation

Polarization monitoring reticle design for high numerical aperture lithography systems

Polarization monitoring reticle design for high numerical aperture lithography systems

Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition

Method to optimize grating test pattern for lithography monitoring and control

Double exposure double resist layer process for forming gate patterns

System and method of predicting problematic areas for lithography in a circuit design

Phase calibration for attenuating phase-shift masks

Pellicle film optimized for immersion lithography systems with NA&gt;1

Apparatus and method for inspection of photolithographic mask

Redundant printing in e-beam lithography

Test method for determining reticle transmission stability

BRUNNER TIMOTHY A

Fast method to model photoresist images using focus blur and resist blur

Method for producing self-aligned mask, articles produced by same and composition for same

System and method of predicting problematic areas for lithography in a circuit design

System and method of predicting problematic areas for lithography in a circuit design

Test method for determining reticle transmission stability

On-product focus offset metrology for use in semiconductor chip manufacturing

GLOBALFOUNDRIES INC

Structure and method to measure focus-dependent pattern shift in integrated circuit imaging

Method for calculating non-correctable EUV blank flatness for blank dispositioning

Using tensile mask to minimize buckling in substrate

Differential dose and focus monitor

PERKIN ELMER CORP

Apparatus for measuring overlay error

Overlay test measurement systems

XEROX CORP

Focus and overlay characterization and optimization for photolithographic exposure

TIRAPU-AZPIROZ JAIONE

EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layer

MENTOR GRAPHICS CORP

System and method of predicting problematic areas for lithography in a circuit design

AUSSCHNITT CHRISTOPHER P

Alignment data based process control system

Pellicle film optimized for immersion lithography systems with NA>1