Inventor
KOBAYASHI NAOYUKI
JP58 patents
⚠️ This page may combine multiple inventors who share the name “KOBAYASHI NAOYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
22 patentsUS7388649B2Jun 17, 2008
Exposure apparatus and method for producing device
NIKON CORP121 citations99
US7589820B2Sep 15, 2009
Exposure apparatus and method for producing device
NIKON CORP49 citations96
US6002987ADec 14, 1999
Methods to control the environment and exposure apparatus
NIKON CORP76 citations96
US5973773AOct 26, 1999
Lens distortion measurement using moire fringes
NIKON CORP44 citations96
US5587794ADec 24, 1996
Surface position detection apparatus
NIKON CORP45 citations96
US7505115B2Mar 17, 2009
Exposure apparatus, method for producing device, and method for controlling exposure apparatus
NIKON CORP19 citations93
US6124933ASep 26, 2000
Exposure apparatus utilizing surface position detection, method thereof, and semiconductor device production method using the apparatus
NIKON CORP20 citations93
US5801835ASep 1, 1998
Surface position detection apparatus and method
NIKON CORP25 citations93
US5767959AJun 16, 1998
Lens distortion measurement using moire fringes
NIKON CORP22 citations93
US7242455B2Jul 10, 2007
Exposure apparatus and method for producing device
NIKON CORP32 citations92
US5870197AFeb 9, 1999
Precision stage interferometer system with local single air duct
NIKON CORP23 citations92
US9304392B2Apr 5, 2016
Exposure apparatus and method for producing device
NIKON CORP4 citations84
US8760617B2Jun 24, 2014
Exposure apparatus and method for producing device
NIKON CORP4 citations84
US8749757B2Jun 10, 2014
Exposure apparatus, method for producing device, and method for controlling exposure apparatus
NIKON CORP4 citations83
US8384877B2Feb 26, 2013
Exposure apparatus and method for producing device
NIKON CORP4 citations74
US9939739B2Apr 10, 2018
Exposure apparatus and method for producing device
NIKON CORP2 citations73
US9760026B2Sep 12, 2017
Exposure apparatus, method for producing device, and method for controlling exposure apparatus
NIKON CORP2 citations73
US9494871B2Nov 15, 2016
Exposure apparatus, method for producing device, and method for controlling exposure apparatus
NIKON CORP2 citations63
US9316921B2Apr 19, 2016
Exposure apparatus, exposure method, and method for producing device
NIKON CORP2 citations63
US7834976B2Nov 16, 2010
Exposure apparatus and method for producing device
NIKON CORP2 citations63
US7817244B2Oct 19, 2010
Exposure apparatus and method for producing device
NIKON CORP2 citations63
US6008883ADec 28, 1999
Apparatus and method for exposure
NIKON CORP2 citations63
KOBAYASHI NAOYUKI
10 patentsUS8174668B2May 8, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI11 citations92
US8729855B2May 20, 2014
Non-contact charging module and non-contact charger
KOBAYASHI NAOYUKI8 citations84
US8169592B2May 1, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74
US8146251B2Apr 3, 2012
Method of manufacturing catalytic converters
KOBAYASHI NAOYUKI9 citations74
US8134682B2Mar 13, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74
US8130363B2Mar 6, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74
US8125612B2Feb 28, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74
US8072576B2Dec 6, 2011
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74
US8605252B2Dec 10, 2013
Exposure apparatus, exposure method, and method for producing device
KOBAYASHI NAOYUKI3 citations63
US8208119B2Jun 26, 2012
Exposure apparatus, exposure method, and method for producing device
KOBAYASHI NAOYUKI3 citations63
JSW AKTINA SYSTEM CO LTD
3 patentsUS12551971B2Feb 17, 2026
Laser processing apparatus, laser processing method, and method for manufacturing semiconductor apparatus
JSW AKTINA SYSTEM CO LTD0 citations60
US12090570B2Sep 17, 2024
Laser processing apparatus, laser processing method, and method for manufacturing semiconductor apparatus
JSW AKTINA SYSTEM CO LTD0 citations60
US11813694B2Nov 14, 2023
Laser processing apparatus, laser processing method, and method for manufacturing semiconductor apparatus
JSW AKTINA SYSTEM CO LTD0 citations60
PANASONIC CORP
2 patentsHENKEL CORP
2 patentsJAPAN STEEL WORKS LTD
2 patentsSANTEN PHARMACEUTICAL CO LTD
2 patentsTABATA KENICHIRO
1 patentNIPPON ZEON CO
1 patentMAGOME NOBUTAKA
1 patentNIHON PARKERIZING
1 patentYUMEX CORP
1 patentNEI MASAHIRO
1 patentNATIONAL UNIV CORPORATION ASAHIKAWA MEDICAL UNIV
1 patentShowing the top 50 of 58 patents by PatentIndex Score.