Inventor

MIYAGI KEN

JP54 patents

⚠️ This page may combine multiple inventors who share the name “MIYAGI KEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MIYAGI KEN

TOKYO OHKA KOGYO CO LTD

Substrate attaching method

Chemically amplified positive photo resist composition and method for forming resist pattern

Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material

Positive photoresist composition and process and synthesizing polyphenol compound

Method of producing structure containing phase-separated structure

Positive photoresist compositions and multilayer resist materials using same

Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer

Method of producing structure containing phase-separated structure

Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern

Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern

Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group

Phenol novolak resin, production process thereof, and positive photoresist composition using the same

Novolak resin, production process thereof and positive photoresist composition using the novolak resin

Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer

Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern

Positive photoresist composition and process for synthesizing polyphenol compound

Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer

Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure

Method of forming contact hole pattern

Block copolymer-containing composition and method of reducing pattern

Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer composition

Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure

Method of producing structure containing phase-separated structure utilizing a brush composition comprising PS-PMMA

Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure

Undercoat agent and method of forming pattern of layer containing block copolymer

Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure

CANON KK

Apparatus for forming superimposed images

Multiimage forming apparatus

Image processing method or apparatus

Beam recorder with scan position control

Image processing apparatus

Image processing system

Control device for controlling motor speed without hunting

Apparatus for processing video signals

Image reading apparatus

Device for controlling movement of a rotating element

Image information transmission system

Image processing system

Control apparatus

Image scanning apparatus

Control unit

Image processing system

Data transmission system

SENZAKI TAKAHIRO

Primer and pattern forming method for layer including block copolymer

Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer

FUJIKAWA SHIGENORI

Substrate provided with metal nanostructure on surface thereof and method of producing the same

Method for producing substrate having surface nanostructure

PARK JUNYOUNG

Battery holder for a battery array, and battery array

TOKYO OHKA KOGYA CO LTD

Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin

TOGYO OHKA KOGYO CO LTD

Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin