Inventor

TANABE MASARU

JP40 patents

⚠️ This page may combine multiple inventors who share the name “TANABE MASARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TANABE MASARU

HOYA CORP

Method of checking unevenness of light-transmitting substance, apparatus therefor, and method of sorting transparent substrates

Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method

Glass substrate for an electron device, photomask blank and photomask using the same

Mask blank substrate, mask blank, transfer mask, and method of manufacturing semiconductor device

Mask blank substrate, mask blank, photomask, and methods of manufacturing the same

Mask blank substrate set and mask blank set

Inspection method for transparent article

Method of inspecting ununiformity of transparent material, apparatus therefor, and method of selecting transparent substrate

Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device

Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks

Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method

Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method

Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method

Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method

Method for manufacturing a mask blank substrate, method for manufacturing a mask blank, method for manufacturing a transfer mask, method for manufacturing a semiconductor device, a mask blank substrate, a mask blank, and a transfer mask

Mask blank substrate, mask blank, transfer mask, and method of manufacturing semiconductor device

Thin film evaluation method, mask blank, and transfer mask

Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method

Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method

Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks

Defect inspection method for a glass substrate for a mask blank, glass substrate for a mask blank, mask blank, exposure mask, method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing an exposure mask

Mask blank substrate, multi-layer reflective film coated substrate, and mask blank

TANABE MASARU

Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device

Method of manufacturing a transfer mask and method of manufacturing a semiconductor device

Photomask blank, photomask blank manufacturing method, and photomask manufacturing method

Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device

Mask blank substrate, mask blank, photomask, and methods of manufacturing the same

Mask blank substrate set and mask blank set

Photomask blank, photomask blank manufacturing method, and photomask manufacturing method

Transparent article

Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

MITSUI CHEMICALS INC

Organic polymer/inorganic fine particle-dispersed aqueous solution having excellent stability and uses thereof

Amphipathic compound having succinic acid skeleton

Reflector, sidelight type backlighting apparatus and reflector substrate

Amphipathic compound having succinic acid skeleton

Amphipathic compound having succinic acid skeleton

NCR CO

Automatic tape windup means

SUZUKI OSAMU

Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method

SAKAI KAZUYA

Thin film evaluation method, mask blank, and transfer mask