Inventor

BOK CHEOL KYU

KR76 patents

⚠️ This page may combine multiple inventors who share the name “BOK CHEOL KYU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BOK CHEOL KYU

HYUNDAI ELECTRONICS IND

Polymer and a forming method of a micro pattern using the same

Polymer and a forming method of a micro pattern using the same

ArF photoresist copolymers

ArF photoresist copolymers

Polymer-containing photoresist, and process for manufacturing the same

Method and forming fine patterns of semiconductor devices using passivation layers

Copolymer resin, preparation thereof, and photoresist using the same

Semiconductor device using polymer-containing photoresist, and process for manufacturing the same

Photoresist polymers of carboxyl-containing alicyclic compounds

Photoresist monomers, polymers thereof, and photoresist compositions containing the same

Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin

Method and photoresist using a photoresist copolymer

Copolymer resin, preparation thereof, and photoresist using the same

Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same

Method for forming fine patterns of semiconductor device

Method for measuring pattern line width during manufacture of a semiconductor device

Photoresist polymers of carboxyl-containing alicyclic compounds

Copolymer for photoresist

Photoresist copolymer

HYNIX SEMICONDUCTOR INC

Method for forming a photoresist pattern

Cleaning solution for photoresist and method for forming pattern using the same

Overcoating composition for photoresist and method for forming photoresist pattern using the same

Method for forming fine pattern of semiconductor device

Semiconductor device and method for forming pattern in the same

Forming fine pattern of semiconductor device using three mask layers and CMP of spin-on carbon layer

Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device

Semiconductor memory device and method for fabricating the same

Semiconductor device and method for forming pattern in the same

Method for forming fine pattern of semiconductor device

Polymer for immersion lithography and photoresist composition

Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same

Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same

Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same

Semiconductor memory device and method for fabricating the same

Method for forming fine pattern of semiconductor device

SK HYNIX INC

Method for forming fine pattern of semiconductor device using double spacer patterning technology

Methods of fabricating interconnection structures

Methods of forming patterns

Methods of fabricating nano-scale structures and nano-scale structures fabricated thereby

Methods of fabricating semiconductor devices and semiconductor devices fabricated thereby

Methods of forming fine patterns

Methods of forming patterns

Methods of forming different sized patterns

Methods for forming patterns in honeycomb array

Methods of fabricating a pattern using the block co-polymer materials

Fine pattern structures having block co-polymer materials

Nano-scale structures

LEE KI LYOUNG

Method for forming pattern of semiconductor device

DONGJIN SEMICHEM CO LTD

Photoresist polymer and photoresist composition containing the same

KIM JAE HEON

Method of manufacturing semiconductor device