Inventor

NORMAN JOHN ANTHONY THOMAS

US35 patents

⚠️ This page may combine multiple inventors who share the name “NORMAN JOHN ANTHONY THOMAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NORMAN JOHN ANTHONY THOMAS

AIR PROD & CHEM

Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants

Preparation of metal imino/amino complexes for metal oxide and metal nitride thin films

Process for metal metalloid oxides and nitrides with compositional gradients

Liquid precursor mixtures for deposition of multicomponent metal containing materials

Process for atomic layer deposition of metal films

Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants

Volatile metal β-ketoiminate and metal β-diiminate complexes

Volatile metal β-ketoiminate complexes

Liquid precursor mixtures for deposition of multicomponent metal containing materials

Synthesis of tantalum nitride

Volatile precursors for deposition of metals and metal-containing films

Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants

Deposition and annealing of multicomponent ZrSnTi and HfSnTi oxide thin films using solventless liquid mixture of precursors

Methods for depositing metal films on diffusion barrier layers by CVD or ALD processes

Production of metal-ligand complexes

Volatile dihydropyrazinly and dihydropyrazine metal complexes

Diffusion barrier layers and processes for depositing metal films thereupon by CVD or ALD processes

Copper CVD precursors with enhanced adhesion properties

Ti, Ta, Hf, Zr and related metal silicon amides for ALD/CVD of metal-silicon nitrides, oxides or oxynitrides

Regeneration of metal CVD precursors

Materials for adhesion enhancement of copper film on diffusion barriers

Methods for depositing metal films onto diffusion barrier layers by CVD or ALD processes

NORMAN JOHN ANTHONY THOMAS

Metal-enolate precursors for depositing metal-containing films

Process for selectively depositing copper thin films on substrates with copper and ruthenium areas via vapor deposition

Copper precursors for thin film deposition

High coordination sphere group 2 metal β-diketiminate precursors

Complexes of imidazole ligands

Complexes of imidazole ligands

Volatile imidazoles and group 2 imidazole based metal precursors

Low temperature thermal conductive inks

Volatile group 2 metal precursors

VRTIS RAYMOND NICHOLAS

Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants

VERSUM MAT US LLC

Volatile dihydropyrazinly and dihydropyrazine metal complexes

LEI XINJIAN

Liquid precursor for depositing group 4 metal containing films

IVANOV SERGEI VLADIMIROVICH

Liquid composition containing aminoether for deposition of metal-containing films