Inventor
WELCH MICHAEL D
US20 patents
⚠️ This page may combine multiple inventors who share the name “WELCH MICHAEL D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
17 patentsUS6716302B2Apr 6, 2004
Dielectric etch chamber with expanded process window
APPLIED MATERIALS INC91 citations98
US6284093B1Sep 4, 2001
Shield or ring surrounding semiconductor workpiece in plasma chamber
APPLIED MATERIALS INC133 citations98
US6192827B1Feb 27, 2001
Double slit-valve doors for plasma processing
APPLIED MATERIALS INC108 citations98
US6797639B2Sep 28, 2004
Dielectric etch chamber with expanded process window
APPLIED MATERIALS INC63 citations96
US6689249B2Feb 10, 2004
Shield or ring surrounding semiconductor workpiece in plasma chamber
APPLIED MATERIALS INC48 citations95
US6015761AJan 18, 2000
Microwave-activated etching of dielectric layers
APPLIED MATERIALS INC62 citations95
US5891350AApr 6, 1999
Adjusting DC bias voltage in plasma chambers
APPLIED MATERIALS INC186 citations95
US7147719B2Dec 12, 2006
Double slit-valve doors for plasma processing
APPLIED MATERIALS INC17 citations92
US6592673B2Jul 15, 2003
Apparatus and method for detecting a presence or position of a substrate
APPLIED MATERIALS INC36 citations92
US6513452B2Feb 4, 2003
Adjusting DC bias voltage in plasma chamber
APPLIED MATERIALS INC29 citations92
US6248206B1Jun 19, 2001
Apparatus for sidewall profile control during an etch process
APPLIED MATERIALS INC33 citations92
US6221782B1Apr 24, 2001
Adjusting DC bias voltage in plasma chamber
APPLIED MATERIALS INC31 citations92
US6391790B1May 21, 2002
Method and apparatus for etching photomasks
APPLIED MATERIALS INC22 citations91
US6899111B2May 31, 2005
Configurable single substrate wet-dry integrated cluster cleaner
APPLIED MATERIALS INC12 citations84
US6647918B1Nov 18, 2003
Double slit-valve doors for plasma processing
APPLIED MATERIALS INC13 citations83
US6534417B2Mar 18, 2003
Method and apparatus for etching photomasks
APPLIED MATERIALS INC7 citations72
US7115523B2Oct 3, 2006
Method and apparatus for etching photomasks
APPLIED MATERIALS INC2 citations60