Inventor
LUSCHER PAUL E
US22 patents
⚠️ This page may combine multiple inventors who share the name “LUSCHER PAUL E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
16 patentsUS6716302B2Apr 6, 2004
Dielectric etch chamber with expanded process window
APPLIED MATERIALS INC91 citations98
US6481886B1Nov 19, 2002
Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system
APPLIED MATERIALS INC92 citations98
US6192827B1Feb 27, 2001
Double slit-valve doors for plasma processing
APPLIED MATERIALS INC108 citations98
US5995235ANov 30, 1999
Bandpass photon detector
APPLIED MATERIALS INC96 citations97
US6916399B1Jul 12, 2005
Temperature controlled window with a fluid supply system
APPLIED MATERIALS INC168 citations96
US6797639B2Sep 28, 2004
Dielectric etch chamber with expanded process window
APPLIED MATERIALS INC63 citations96
US5737177AApr 7, 1998
Apparatus and method for actively controlling the DC potential of a cathode pedestal
APPLIED MATERIALS INC93 citations93
US7147719B2Dec 12, 2006
Double slit-valve doors for plasma processing
APPLIED MATERIALS INC17 citations92
US6589361B2Jul 8, 2003
Configurable single substrate wet-dry integrated cluster cleaner
APPLIED MATERIALS INC35 citations92
US6513452B2Feb 4, 2003
Adjusting DC bias voltage in plasma chamber
APPLIED MATERIALS INC29 citations92
US6221782B1Apr 24, 2001
Adjusting DC bias voltage in plasma chamber
APPLIED MATERIALS INC31 citations92
US6076482AJun 20, 2000
Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion
APPLIED MATERIALS INC41 citations92
US6535779B1Mar 18, 2003
Apparatus and method for endpoint control and plasma monitoring
APPLIED MATERIALS INC41 citations87
US6899111B2May 31, 2005
Configurable single substrate wet-dry integrated cluster cleaner
APPLIED MATERIALS INC12 citations84
US6647918B1Nov 18, 2003
Double slit-valve doors for plasma processing
APPLIED MATERIALS INC13 citations83
US6822185B2Nov 23, 2004
Temperature controlled dome-coil system for high power inductively coupled plasma systems
APPLIED MATERIALS INC7 citations73