Inventor
CARDUCCI JAMES D
US77 patents
⚠️ This page may combine multiple inventors who share the name “CARDUCCI JAMES D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
40 patentsUS9741546B2Aug 22, 2017
Symmetric plasma process chamber
APPLIED MATERIALS INC385 citations99
US10580620B2Mar 3, 2020
Symmetric plasma process chamber
APPLIED MATERIALS INC38 citations98
US10546728B2Jan 28, 2020
Symmetric plasma process chamber
APPLIED MATERIALS INC39 citations98
US10535502B2Jan 14, 2020
Symmetric plasma process chamber
APPLIED MATERIALS INC35 citations98
US10453656B2Oct 22, 2019
Symmetric plasma process chamber
APPLIED MATERIALS INC36 citations98
US10312056B2Jun 4, 2019
Distributed electrode array for plasma processing
APPLIED MATERIALS INC39 citations98
US6983892B2Jan 10, 2006
Gas distribution showerhead for semiconductor processing
APPLIED MATERIALS INC190 citations98
US6900596B2May 31, 2005
Capacitively coupled plasma reactor with uniform radial distribution of plasma
APPLIED MATERIALS INC224 citations98
US6716302B2Apr 6, 2004
Dielectric etch chamber with expanded process window
APPLIED MATERIALS INC91 citations98
US6192827B1Feb 27, 2001
Double slit-valve doors for plasma processing
APPLIED MATERIALS INC108 citations98
US6797639B2Sep 28, 2004
Dielectric etch chamber with expanded process window
APPLIED MATERIALS INC63 citations96
US6562189B1May 13, 2003
Plasma reactor with a tri-magnet plasma confinement apparatus
APPLIED MATERIALS INC69 citations96
US7987814B2Aug 2, 2011
Lower liner with integrated flow equalizer and improved conductance
APPLIED MATERIALS INC26 citations92
US7147719B2Dec 12, 2006
Double slit-valve doors for plasma processing
APPLIED MATERIALS INC17 citations92
US6589361B2Jul 8, 2003
Configurable single substrate wet-dry integrated cluster cleaner
APPLIED MATERIALS INC35 citations92
US6513452B2Feb 4, 2003
Adjusting DC bias voltage in plasma chamber
APPLIED MATERIALS INC29 citations92
US6221782B1Apr 24, 2001
Adjusting DC bias voltage in plasma chamber
APPLIED MATERIALS INC31 citations92
US11587766B2Feb 21, 2023
Symmetric VHF source for a plasma reactor
APPLIED MATERIALS INC4 citations86
US10249495B2Apr 2, 2019
Diamond like carbon layer formed by an electron beam plasma process
APPLIED MATERIALS INC17 citations85
US10475626B2Nov 12, 2019
Ion-ion plasma atomic layer etch process and reactor
APPLIED MATERIALS INC12 citations84
US10418225B2Sep 17, 2019
Distributed electrode array for plasma processing
APPLIED MATERIALS INC4 citations84
US10249470B2Apr 2, 2019
Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding
APPLIED MATERIALS INC10 citations84
US10170279B2Jan 1, 2019
Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding
APPLIED MATERIALS INC11 citations84
US9824862B2Nov 21, 2017
Symmetric VHF source for a plasma reactor
APPLIED MATERIALS INC4 citations84
US9745663B2Aug 29, 2017
Symmetrical inductively coupled plasma source with symmetrical flow chamber
APPLIED MATERIALS INC8 citations84
US9082590B2Jul 14, 2015
Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates
APPLIED MATERIALS INC8 citations84
US7972467B2Jul 5, 2011
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
APPLIED MATERIALS INC10 citations84
US7754997B2Jul 13, 2010
Apparatus and method to confine plasma and reduce flow resistance in a plasma
APPLIED MATERIALS INC8 citations84
US7585384B2Sep 8, 2009
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
APPLIED MATERIALS INC10 citations84
US6899111B2May 31, 2005
Configurable single substrate wet-dry integrated cluster cleaner
APPLIED MATERIALS INC12 citations84
US6647918B1Nov 18, 2003
Double slit-valve doors for plasma processing
APPLIED MATERIALS INC13 citations83
US11814724B2Nov 14, 2023
Continuous liner for use in a processing chamber
APPLIED MATERIALS INC2 citations73
US11499223B2Nov 15, 2022
Continuous liner for use in a processing chamber
APPLIED MATERIALS INC2 citations73
US11315760B2Apr 26, 2022
Symmetric plasma process chamber
APPLIED MATERIALS INC1 citations73
US11114284B2Sep 7, 2021
Plasma reactor with electrode array in ceiling
APPLIED MATERIALS INC4 citations73
US11101113B2Aug 24, 2021
Ion-ion plasma atomic layer etch process
APPLIED MATERIALS INC2 citations73
US11043361B2Jun 22, 2021
Symmetric VHF source for a plasma reactor
APPLIED MATERIALS INC3 citations73
US11043360B2Jun 22, 2021
Gas distribution plate assembly for high power plasma etch processes
APPLIED MATERIALS INC4 citations73
US10811226B2Oct 20, 2020
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates
APPLIED MATERIALS INC4 citations73
US10615006B2Apr 7, 2020
Symmetric plasma process chamber
APPLIED MATERIALS INC1 citations73
CARDUCCI JAMES D
5 patentsUS9653267B2May 16, 2017
Temperature controlled chamber liner
CARDUCCI JAMES D319 citations98
US8282736B2Oct 9, 2012
Lower liner with integrated flow equalizer and improved conductance
CARDUCCI JAMES D14 citations92
US8118938B2Feb 21, 2012
Lower liner with integrated flow equalizer and improved conductance
CARDUCCI JAMES D26 citations92
US8440019B2May 14, 2013
Lower liner with integrated flow equalizer and improved conductance
CARDUCCI JAMES D7 citations83
US8313578B2Nov 20, 2012
Etching chamber having flow equalizer and lower liner
CARDUCCI JAMES D13 citations83
BAHNG KENNETH J
1 patentCARDUCCI DUAL SPORT LLC
1 patentCOLLINS KENNETH S
1 patentRAMASWAMY KARTIK
1 patentNOORBAKHSH HAMID
1 patentShowing the top 50 of 77 patents by PatentIndex Score.