P

Inventor

CARDUCCI JAMES D

US77 patents
⚠️ This page may combine multiple inventors who share the name “CARDUCCI JAMES D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

40 patents
US9741546B2Aug 22, 2017

Symmetric plasma process chamber

APPLIED MATERIALS INC385 citations99
US10580620B2Mar 3, 2020

Symmetric plasma process chamber

APPLIED MATERIALS INC38 citations98
US10546728B2Jan 28, 2020

Symmetric plasma process chamber

APPLIED MATERIALS INC39 citations98
US10535502B2Jan 14, 2020

Symmetric plasma process chamber

APPLIED MATERIALS INC35 citations98
US10453656B2Oct 22, 2019

Symmetric plasma process chamber

APPLIED MATERIALS INC36 citations98
US10312056B2Jun 4, 2019

Distributed electrode array for plasma processing

APPLIED MATERIALS INC39 citations98
US6983892B2Jan 10, 2006

Gas distribution showerhead for semiconductor processing

APPLIED MATERIALS INC190 citations98
US6900596B2May 31, 2005

Capacitively coupled plasma reactor with uniform radial distribution of plasma

APPLIED MATERIALS INC224 citations98
US6716302B2Apr 6, 2004

Dielectric etch chamber with expanded process window

APPLIED MATERIALS INC91 citations98
US6192827B1Feb 27, 2001

Double slit-valve doors for plasma processing

APPLIED MATERIALS INC108 citations98
US6797639B2Sep 28, 2004

Dielectric etch chamber with expanded process window

APPLIED MATERIALS INC63 citations96
US6562189B1May 13, 2003

Plasma reactor with a tri-magnet plasma confinement apparatus

APPLIED MATERIALS INC69 citations96
US7987814B2Aug 2, 2011

Lower liner with integrated flow equalizer and improved conductance

APPLIED MATERIALS INC26 citations92
US7147719B2Dec 12, 2006

Double slit-valve doors for plasma processing

APPLIED MATERIALS INC17 citations92
US6589361B2Jul 8, 2003

Configurable single substrate wet-dry integrated cluster cleaner

APPLIED MATERIALS INC35 citations92
US6513452B2Feb 4, 2003

Adjusting DC bias voltage in plasma chamber

APPLIED MATERIALS INC29 citations92
US6221782B1Apr 24, 2001

Adjusting DC bias voltage in plasma chamber

APPLIED MATERIALS INC31 citations92
US11587766B2Feb 21, 2023

Symmetric VHF source for a plasma reactor

APPLIED MATERIALS INC4 citations86
US10249495B2Apr 2, 2019

Diamond like carbon layer formed by an electron beam plasma process

APPLIED MATERIALS INC17 citations85
US10475626B2Nov 12, 2019

Ion-ion plasma atomic layer etch process and reactor

APPLIED MATERIALS INC12 citations84
US10418225B2Sep 17, 2019

Distributed electrode array for plasma processing

APPLIED MATERIALS INC4 citations84
US10249470B2Apr 2, 2019

Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding

APPLIED MATERIALS INC10 citations84
US10170279B2Jan 1, 2019

Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding

APPLIED MATERIALS INC11 citations84
US9824862B2Nov 21, 2017

Symmetric VHF source for a plasma reactor

APPLIED MATERIALS INC4 citations84
US9745663B2Aug 29, 2017

Symmetrical inductively coupled plasma source with symmetrical flow chamber

APPLIED MATERIALS INC8 citations84
US9082590B2Jul 14, 2015

Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates

APPLIED MATERIALS INC8 citations84
US7972467B2Jul 5, 2011

Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor

APPLIED MATERIALS INC10 citations84
US7754997B2Jul 13, 2010

Apparatus and method to confine plasma and reduce flow resistance in a plasma

APPLIED MATERIALS INC8 citations84
US7585384B2Sep 8, 2009

Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor

APPLIED MATERIALS INC10 citations84
US6899111B2May 31, 2005

Configurable single substrate wet-dry integrated cluster cleaner

APPLIED MATERIALS INC12 citations84
US6647918B1Nov 18, 2003

Double slit-valve doors for plasma processing

APPLIED MATERIALS INC13 citations83
US11814724B2Nov 14, 2023

Continuous liner for use in a processing chamber

APPLIED MATERIALS INC2 citations73
US11499223B2Nov 15, 2022

Continuous liner for use in a processing chamber

APPLIED MATERIALS INC2 citations73
US11315760B2Apr 26, 2022

Symmetric plasma process chamber

APPLIED MATERIALS INC1 citations73
US11114284B2Sep 7, 2021

Plasma reactor with electrode array in ceiling

APPLIED MATERIALS INC4 citations73
US11101113B2Aug 24, 2021

Ion-ion plasma atomic layer etch process

APPLIED MATERIALS INC2 citations73
US11043361B2Jun 22, 2021

Symmetric VHF source for a plasma reactor

APPLIED MATERIALS INC3 citations73
US11043360B2Jun 22, 2021

Gas distribution plate assembly for high power plasma etch processes

APPLIED MATERIALS INC4 citations73
US10811226B2Oct 20, 2020

Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates

APPLIED MATERIALS INC4 citations73
US10615006B2Apr 7, 2020

Symmetric plasma process chamber

APPLIED MATERIALS INC1 citations73

CARDUCCI JAMES D

5 patents

BAHNG KENNETH J

1 patent

CARDUCCI DUAL SPORT LLC

1 patent

COLLINS KENNETH S

1 patent

RAMASWAMY KARTIK

1 patent

NOORBAKHSH HAMID

1 patent

Showing the top 50 of 77 patents by PatentIndex Score.