Inventor
HOMMA YOSHIO
JP46 patents
⚠️ This page may combine multiple inventors who share the name “HOMMA YOSHIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
33 patentsUS6117775ASep 12, 2000
Polishing method
HITACHI LTD254 citations99
US5609511AMar 11, 1997
Polishing method
HITACHI LTD413 citations99
US4897709AJan 30, 1990
Titanium nitride film in contact hole with large aspect ratio
HITACHI LTD151 citations99
US6562719B2May 13, 2003
Methods of polishing, interconnect-fabrication, and producing semiconductor devices
HITACHI LTD88 citations98
US6326299B1Dec 4, 2001
Method for manufacturing a semiconductor device
HITACHI LTD88 citations98
US6596638B1Jul 22, 2003
Polishing method
HITACHI LTD33 citations96
US6561883B1May 13, 2003
Method of polishing
HITACHI LTD59 citations96
US6376345B1Apr 23, 2002
Process for manufacturing semiconductor integrated circuit device
HITACHI LTD46 citations96
US6043155AMar 28, 2000
Polishing agent and polishing method
HITACHI LTD56 citations96
US5772780AJun 30, 1998
Polishing agent and polishing method
HITACHI LTD68 citations96
US5270259ADec 14, 1993
Method for fabricating an insulating film from a silicone resin using O.sub.
HITACHI LTD69 citations96
US5177589AJan 5, 1993
Refractory metal thin film having a particular step coverage factor and ratio of surface roughness
HITACHI LTD54 citations96
US4599135AJul 8, 1986
Thin film deposition
HITACHI LTD82 citations96
US4717462AJan 5, 1988
Sputtering apparatus
HITACHI LTD102 citations95
US6638854B2Oct 28, 2003
Semiconductor device and method for manufacturing the same
HITACHI LTD25 citations93
US6561875B1May 13, 2003
Apparatus and method for producing substrate with electrical wire thereon
HITACHI LTD20 citations93
US6509273B1Jan 21, 2003
Method for manufacturing a semiconductor device
HITACHI LTD36 citations93
US6458674B1Oct 1, 2002
Process for manufacturing semiconductor integrated circuit device
HITACHI LTD16 citations93
US6565422B1May 20, 2003
Polishing apparatus using substantially abrasive-free liquid with mixture unit near polishing unit, and plant using the polishing apparatus
HITACHI LTD29 citations92
US5175017ADec 29, 1992
Method of forming metal or metal silicide film
HITACHI LTD43 citations92
US4842891AJun 27, 1989
Method of forming a copper film by chemical vapor deposition
HITACHI LTD27 citations92
US4539616ASep 3, 1985
Thin film magnetic head and fabricating method thereof
HITACHI LTD31 citations92
US6180020B1Jan 30, 2001
Polishing method and apparatus
HITACHI LTD46 citations91
US6478977B1Nov 12, 2002
Polishing method and apparatus
HITACHI LTD15 citations83
US6531400B2Mar 11, 2003
Process for manufacturing semiconductor integrated circuit device
HITACHI LTD12 citations82
US7132367B2Nov 7, 2006
Polishing method
HITACHI LTD4 citations74
US6221773B1Apr 24, 2001
Method for working semiconductor wafer
HITACHI LTD12 citations74
US5444000AAug 22, 1995
Method of fabricating integrated circuit with improved yield rate
HITACHI LTD12 citations74
US4710398ADec 1, 1987
Semiconductor device and manufacturing method thereof
HITACHI LTD17 citations74
US4073054AFeb 14, 1978
Method of fabricating semiconductor device
HITACHI LTD16 citations73
US7279425B2Oct 9, 2007
Polishing method
HITACHI LTD2 citations63
US6676496B2Jan 13, 2004
Apparatus for processing semiconductor wafers
HITACHI LTD2 citations63
US4394245AJul 19, 1983
Sputtering apparatus
HITACHI LTD1 citations52
RENESAS TECH CORP
12 patentsUS6774041B1Aug 10, 2004
Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device
RENESAS TECH CORP52 citations96
US7659201B2Feb 9, 2010
Process for manufacturing semiconductor integrated circuit device
RENESAS TECH CORP10 citations93
US6750128B2Jun 15, 2004
Methods of polishing, interconnect-fabrication, and producing semiconductor devices
RENESAS TECH CORP34 citations93
US6899603B2May 31, 2005
Polishing apparatus
RENESAS TECH CORP37 citations92
US6719618B2Apr 13, 2004
Polishing apparatus
RENESAS TECH CORP17 citations92
US6815357B2Nov 9, 2004
Process and apparatus for manufacturing a semiconductor device
RENESAS TECH CORP16 citations84
US7510970B2Mar 31, 2009
Process for manufacturing semiconductor integrated circuit device
RENESAS TECH CORP5 citations74
US6800557B2Oct 5, 2004
Process for manufacturing semiconductor integrated circuit device
RENESAS TECH CORP8 citations74
US7183212B2Feb 27, 2007
Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device
RENESAS TECH CORP3 citations63
US7026245B2Apr 11, 2006
Polishing agent and polishing method
RENESAS TECH CORP1 citations63
US6855035B2Feb 15, 2005
Apparatus and method for producing substrate with electrical wire thereon
RENESAS TECH CORP5 citations63
US7563716B2Jul 21, 2009
Polishing method
RENESAS TECH CORP0 citations52