Inventor
SYAU TSENGYOU
US8 patents
Patents
8 patentsUS7037774B1May 2, 2006
Self-aligned contact structure and process for forming self-aligned contact structure
INTEGRATED DEVICE TECH57 citations94
US7582567B1Sep 1, 2009
Method for forming CMOS device with self-aligned contacts and region formed using salicide process
INTEGRATED DEVICE TECH26 citations92
US7098114B1Aug 29, 2006
Method for forming cmos device with self-aligned contacts and region formed using salicide process
INTEGRATED DEVICE TECH22 citations92
US6534414B1Mar 18, 2003
Dual-mask etch of dual-poly gate in CMOS processing
INTEGRATED DEVICE TECH33 citations90
US6566236B1May 20, 2003
Gate structures with increased etch margin for self-aligned contact and the method of forming the same
INTEGRATED DEVICE TECH16 citations82
US7125783B2Oct 24, 2006
Dielectric anti-reflective coating surface treatment to prevent defect generation in associated wet clean
INTEGRATED DEVICE TECH14 citations79
US6306771B1Oct 23, 2001
Process for preventing the formation of ring defects
INTEGRATED DEVICE TECH10 citations68
US7125775B1Oct 24, 2006
Method for forming hybrid device gates
INTEGRATED DEVICE TECH5 citations56