Inventor
MORISADA YOSHINORI
JP21 patents
⚠️ This page may combine multiple inventors who share the name “MORISADA YOSHINORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASM JAPAN
17 patentsUS6383955B1May 7, 2002
Silicone polymer insulation film on semiconductor substrate and method for forming the film
ASM JAPAN857 citations98
US6352945B1Mar 5, 2002
Silicone polymer insulation film on semiconductor substrate and method for forming the film
ASM JAPAN718 citations98
US7504344B2Mar 17, 2009
Method of forming a carbon polymer film using plasma CVD
ASM JAPAN419 citations97
US7064088B2Jun 20, 2006
Method for forming low-k hard film
ASM JAPAN62 citations96
US6631692B1Oct 14, 2003
Plasma CVD film-forming device
ASM JAPAN73 citations96
US6559520B2May 6, 2003
Siloxan polymer film on semiconductor substrate
ASM JAPAN87 citations96
US6514880B2Feb 4, 2003
Siloxan polymer film on semiconductor substrate and method for forming same
ASM JAPAN63 citations95
US6881683B2Apr 19, 2005
Insulation film on semiconductor substrate and method for forming same
ASM JAPAN51 citations92
US6784123B2Aug 31, 2004
Insulation film on semiconductor substrate and method for forming same
ASM JAPAN28 citations92
US6740367B2May 25, 2004
Plasma CVD film-forming device
ASM JAPAN34 citations92
US7381291B2Jun 3, 2008
Dual-chamber plasma processing apparatus
ASM JAPAN24 citations91
US6852650B2Feb 8, 2005
Insulation film on semiconductor substrate and method for forming same
ASM JAPAN19 citations84
US6759344B2Jul 6, 2004
Method for forming low dielectric constant interlayer insulation film
ASM JAPAN4 citations63
US7410915B2Aug 12, 2008
Method of forming carbon polymer film using plasma CVD
ASM JAPAN6 citations62
US7470633B2Dec 30, 2008
Method of forming a carbon polymer film using plasma CVD
ASM JAPAN3 citations61
US7638441B2Dec 29, 2009
Method of forming a carbon polymer film using plasma CVD
ASM JAPAN1 citations52
US7799134B2Sep 21, 2010
Shower plate having projections and plasma CVD apparatus using same
ASM JAPAN1 citations51
TOKYO ELECTRON LTD
4 patentsUS12060635B2Aug 13, 2024
Hard mask, substrate processing method, and substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
US11993849B2May 28, 2024
Carbon hard mask, film forming apparatus, and film forming method
TOKYO ELECTRON LTD0 citations62
US9708507B2Jul 18, 2017
Method for improving chemical resistance of polymerized film, polymerized film forming method, film forming apparatus, and electronic product manufacturing method
TOKYO ELECTRON LTD0 citations52
US9422452B2Aug 23, 2016
Polymerized film forming method
TOKYO ELECTRON LTD0 citations42