Inventor
PARK JOON-SOO
KR23 patents
⚠️ This page may combine multiple inventors who share the name “PARK JOON-SOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
20 patentsUS8003543B2Aug 23, 2011
Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD21 citations92
US7842601B2Nov 30, 2010
Method of forming small pitch pattern using double spacers
SAMSUNG ELECTRONICS CO LTD44 citations92
US7732341B2Jun 8, 2010
Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD18 citations92
US7473647B2Jan 6, 2009
Method of forming pattern using fine pitch hard mask
SAMSUNG ELECTRONICS CO LTD18 citations92
US6522351B1Feb 18, 2003
Stereoscopic image display apparatus using a single projector
SAMSUNG ELECTRONICS CO LTD35 citations92
US5867320AFeb 2, 1999
Lens unit for projector
SAMSUNG ELECTRONICS CO LTD24 citations92
US7732279B2Jun 8, 2010
Semiconductor device with improved overlay margin and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD11 citations84
US6716746B1Apr 6, 2004
Semiconductor device having self-aligned contact and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD16 citations83
US8614148B2Dec 24, 2013
Methods for forming fine patterns of a semiconductor device
SAMSUNG ELECTRONICS CO LTD7 citations82
US8785319B2Jul 22, 2014
Methods for forming fine patterns of a semiconductor device
SAMSUNG ELECTRONICS CO LTD13 citations81
US7205241B2Apr 17, 2007
Method for manufacturing semiconductor device with contact body extended in direction of bit line
SAMSUNG ELECTRONICS CO LTD8 citations73
US7518704B2Apr 14, 2009
Multiple exposure apparatus and multiple exposure method using the same
SAMSUNG ELECTRONICS CO LTD3 citations63
US6960414B2Nov 1, 2005
Multi-exposure lithography method and system providing increased overlay accuracy
SAMSUNG ELECTRONICS CO LTD3 citations63
US8034684B2Oct 11, 2011
Semiconductor device with improved overlay margin and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD2 citations62
US7414279B2Aug 19, 2008
Semiconductor device with improved overlay margin and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD4 citations62
US10553438B2Feb 4, 2020
Semiconductor device and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD1 citations57
US10276373B2Apr 30, 2019
Method of manufacturing a semiconductor device
SAMSUNG ELECTRONICS CO LTD1 citations57
US7463333B2Dec 9, 2008
Multi-exposure lithography system providing increased overlay accuracy
SAMSUNG ELECTRONICS CO LTD1 citations52
US7879726B2Feb 1, 2011
Methods of forming semiconductor devices using selective etching of an active region through a hardmask
SAMSUNG ELECTRONICS CO LTD1 citations51
US7550383B2Jun 23, 2009
Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations42