Inventor
PARK WAN-JUN
KR41 patents
⚠️ This page may combine multiple inventors who share the name “PARK WAN-JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
33 patentsUS6781871B2Aug 24, 2004
Magnetic random access memory and method of operating the same
SAMSUNG ELECTRONICS CO LTD71 citations98
US7132714B2Nov 7, 2006
Vertical carbon nanotube-field effect transistor and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD19 citations92
US6924520B2Aug 2, 2005
MRAM including unit cell formed of one transistor and two magnetic tunnel junctions (MTJS) and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD17 citations92
US6815784B2Nov 9, 2004
Magneto-resistive random access memory
SAMSUNG ELECTRONICS CO LTD29 citations91
US7453085B2Nov 18, 2008
Nano-elastic memory device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD17 citations90
US7767502B2Aug 3, 2010
Method for manufacturing electronic device using thin film transistor with protective cap over flexible substrate
SAMSUNG ELECTRONICS CO LTD8 citations84
US7639524B2Dec 29, 2009
Multi-bit nonvolatile memory devices and methods of operating the same
SAMSUNG ELECTRONICS CO LTD12 citations84
US7936030B2May 3, 2011
Methods of operating semiconductor memory devices including magnetic films having electrochemical potential difference therebetween
SAMSUNG ELECTRONICS CO LTD9 citations83
US7387735B2Jun 17, 2008
Method of isolating semiconducting carbon nanotubes
SAMSUNG ELECTRONICS CO LTD10 citations82
US7220599B2May 22, 2007
Method for manufacturing magneto-resistive random access memory
SAMSUNG ELECTRONICS CO LTD10 citations82
US7625812B2Dec 1, 2009
Silicon nano wires, semiconductor device including the same, and method of manufacturing the silicon nano wires
SAMSUNG ELECTRONICS CO LTD13 citations81
US7115306B2Oct 3, 2006
Method of horizontally growing carbon nanotubes and device having the same
SAMSUNG ELECTRONICS CO LTD12 citations81
US7176488B2Feb 13, 2007
Thin film transistor with protective cap over flexible substrate, electronic device using the same, and manufacturing method thereof
SAMSUNG ELECTRONICS CO LTD9 citations74
US7170777B2Jan 30, 2007
Phase change memory device and method of operating the same
SAMSUNG ELECTRONICS CO LTD7 citations74
US7165197B2Jan 16, 2007
Apparatus and method of analyzing a magnetic random access memory
SAMSUNG ELECTRONICS CO LTD9 citations74
US7061034B2Jun 13, 2006
Magnetic random access memory including middle oxide layer and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD8 citations74
US6894920B2May 17, 2005
Magnetic random access memory (MRAM) for spontaneous hall effect and method of writing and reading data using the MRAM
SAMSUNG ELECTRONICS CO LTD9 citations74
US7705347B2Apr 27, 2010
N-type carbon nanotube field effect transistor and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD5 citations73
US7381983B2Jun 3, 2008
N-type carbon nanotube field effect transistor and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD8 citations73
US7272033B2Sep 18, 2007
Magnetic film structure using spin charge, a method of manufacturing the same, a semiconductor device having the same, and a method of operating the semiconductor device
SAMSUNG ELECTRONICS CO LTD4 citations73
US7195929B2Mar 27, 2007
MRAM including unit cell formed of one transistor and two magnetic tunnel junctions (MTJs) and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD7 citations73
US7816175B2Oct 19, 2010
Nano-elastic memory device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD5 citations71
US7897412B2Mar 1, 2011
Method of manufacturing magnetic random access memory including middle oxide layer
SAMSUNG ELECTRONICS CO LTD3 citations63
US7015555B2Mar 21, 2006
Magnetoresistive random access memory with high selectivity
SAMSUNG ELECTRONICS CO LTD3 citations63
US7002841B2Feb 21, 2006
MRAM and methods for manufacturing and driving the same
SAMSUNG ELECTRONICS CO LTD2 citations63
US7811833B2Oct 12, 2010
Method of manufacturing a multi-purpose magnetic film structure
SAMSUNG ELECTRONICS CO LTD2 citations62
US7799307B2Sep 21, 2010
Method of growing single-walled carbon nanotubes
SAMSUNG ELECTRONICS CO LTD3 citations62
US7767140B2Aug 3, 2010
Method for manufacturing zinc oxide nanowires and device having the same
SAMSUNG ELECTRONICS CO LTD5 citations62
US7918989B2Apr 5, 2011
Gas sensor and method thereof
SAMSUNG ELECTRONICS CO LTD1 citations52
US7713509B2May 11, 2010
Method of forming nitrogen-doped single-walled carbon nanotubes
SAMSUNG ELECTRONICS CO LTD1 citations52
US7604790B2Oct 20, 2009
Method of removing carbonaceous impurities in carbon nanotubes
SAMSUNG ELECTRONICS CO LTD1 citations52
US7317219B2Jan 8, 2008
Magnetic random access memory (MRAM) and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US7560394B2Jul 14, 2009
Nanodots formed on silicon oxide and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD1 citations43
SEO SUN-AE
2 patentsUS8164130B2Apr 24, 2012
Nonvolatile memory device comprising one switching device and one resistant material and method of manufacturing the same
SEO SUN-AE7 citations83
US8101983B2Jan 24, 2012
Nonvolatile memory device comprising one switching device and one resistant material and method of manufacturing the same
SEO SUN-AE7 citations83
PARK WAN-JUN
2 patentsMIN YO-SEP
2 patentsUS8294348B2Oct 23, 2012
Field emission electrode, method of manufacturing the same, and field emission device comprising the same
MIN YO-SEP0 citations47
US8272914B2Sep 25, 2012
Method of manufacturing field emission electrode having carbon nanotubes with conductive particles attached to external walls
MIN YO-SEP0 citations47