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Inventor
YIIN TZUYUAN
US
2 patents
Patents
2 patents
US6559052B2
May 6, 2003
Deposition of amorphous silicon films by high density plasma HDP-CVD at low temperatures
APPLIED MATERIALS INC
10 citations
70
US6524969B2
Feb 25, 2003
High density plasma chemical vapor deposition (HDP-CVD) processing of gallium arsenide wafers
APPLIED MATERIALS INC
1 citations
48