Inventor

LEE HYO-SAN

KR38 patents

⚠️ This page may combine multiple inventors who share the name “LEE HYO-SAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEE HYO-SAN

SAMSUNG ELECTRONICS CO LTD

Vertical-type semiconductor device

PAA-based etchant, methods of using same, and resultant structures

PAA-based etchant, methods of using same, and resultant structures

Method of treating substrates using supercritical fluids

Spot heater and device for cleaning wafer using the same

Apparatus for treating substrates using supercritical fluids, substrate treatment system including the same and method of treating substrates using the same

Spot heater and device for cleaning wafer using the same

Etchant composition and method of fabricating semiconductor device

Preparing conditioning disk for chemical mechanical polishing and chemical mechanical polishing method including the same

Apparatus for treating wafers using supercritical fluid

Method of removing chemicals from a substrate

Etchant composition

Cerium oxide nanoparticles, methods for fabricating the same and methods for fabricating a semiconductor device using the same

Oxide film coating solution and semiconductor device manufacturing method using the same

Method of cleaning a substrate and apparatus for performing the same

Etching compositions and methods for fabricating semiconductor devices by using the same

Substrate cleaning composition, method for cleaning substrate using the same, and method for fabricating semiconductor device using the same

Apparatus for treating wafers using supercritical fluid

Cleaning solution composition and method of cleaning semiconductor device using the same

Method of removing photoresist and method of manufacturing a semiconductor device

Compositions for removing photoresist

Methods of manufacturing semiconductor devices using a composition for removing photoresist and methods of removing photoresist from a semiconductor substrate

Cleaning composition, cleaning apparatus, and method of fabricating semiconductor device using the same

Chemical mechanical polishing method and method for fabricating semiconductor device using the same

Chemical mechanical polishing apparatus for controlling polishing uniformity

Chemical liquid supply apparatus and semiconductor processing apparatus having the same

Source supplier for a supercritical fluid, substrate processing apparatus having the same

LEE HYO-SAN

Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods

Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods

Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods

Apparatus for treating wafers using supercritical fluid

Method of manufacturing a semiconductor device using an etchant

Methods of forming a hole having a vertical profile and semiconductor devices having a vertical hole

KANG DAE-HYUK

Integrated circuit capacitors having sidewall supports

Methods of forming integrated circuit capacitors having sidewall supports and capacitors formed thereby

KIM GO-UN

Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device

CHO YONG-JHIN

Substrate processing method and substrate processing system for performing the same

BAI KEUN-HEE

Fabricating method of semiconductor device