Inventor
SOGA KYOKO
JP15 patents
⚠️ This page may combine multiple inventors who share the name “SOGA KYOKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
13 patentsUS10319653B2Jun 11, 2019
Semiconductor apparatus, stacked semiconductor apparatus, encapsulated stacked-semiconductor apparatus, and method for manufacturing the same
SHINETSU CHEMICAL CO3 citations73
US9012111B2Apr 21, 2015
Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic part
SHINETSU CHEMICAL CO6 citations73
US10416557B2Sep 17, 2019
Method for manufacturing semiconductor apparatus, method for manufacturing flip-chip type semiconductor apparatus, semiconductor apparatus, and flip-chip type semiconductor apparatus
SHINETSU CHEMICAL CO2 citations72
US11119409B2Sep 14, 2021
Polysiloxane skeleton polymer, photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device
SHINETSU CHEMICAL CO0 citations62
US10416559B2Sep 17, 2019
Film material and pattern forming process
SHINETSU CHEMICAL CO1 citations62
US6773858B2Aug 10, 2004
Positive photoresist composition
SHINETSU CHEMICAL CO5 citations62
US10948823B2Mar 16, 2021
Laminate and pattern forming method
SHINETSU CHEMICAL CO0 citations52
US10141272B2Nov 27, 2018
Semiconductor apparatus, stacked semiconductor apparatus and encapsulated stacked-semiconductor apparatus each having photo-curable resin layer
SHINETSU CHEMICAL CO1 citations52
US11548985B2Jan 10, 2023
Siloxane polymer containing isocyanuric acid and polyether skeletons, photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device
SHINETSU CHEMICAL CO0 citations51
US9971242B2May 15, 2018
Photo-curable resin composition and photo-curable dry film using the same
SHINETSU CHEMICAL CO0 citations41
US9796892B2Oct 24, 2017
Silicone adhesive composition and solid-state imaging device
SHINETSU CHEMICAL CO0 citations41
US9620429B2Apr 11, 2017
Semiconductor apparatus, stacked semiconductor apparatus, encapsulated stacked-semiconductor apparatus, and method for manufacturing the same
SHINETSU CHEMICAL CO0 citations41
US9494863B2Nov 15, 2016
Chemically amplified negative resist composition, photo-curable dry film, making method, patterning process, and electric/electronic part-protecting film
SHINETSU CHEMICAL CO0 citations41