Inventor

TAKEDA TAKANOBU

JP50 patents

⚠️ This page may combine multiple inventors who share the name “TAKEDA TAKANOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAKEDA TAKANOBU

SHINETSU CHEMICAL CO

Ester compounds, polymers, resist compositions and patterning process

Silicon-containing polymer, resist composition and patterning process

Silicon-containing polymer, resist composition and patterning process

Silicon-containing polymer, resist composition and patterning process

Resist composition and patterning process

Resist compositions and patterning process

Dendritic polymers and making method

Polymer, resist composition and patterning process using the same

Chemically amplified positive resist composition and patterning method

Photomask blank, resist pattern forming process, and photomask preparation process

Resist composition and patterning process

Positive resist composition and patterning process using the same

Bottom resist layer composition and patterning process using the same

Photoresist undercoat-forming material and patterning process

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Positive resist composition

Preparation of polymer, and resist composition using the polymer

Chemical amplification type resist composition

Resist composition and patterning process

Negative resist material and pattern formation method using the same

Chemical amplification resist compositions

Resist composition and patterning process

Positive resist composition and patterning process using the same

Negative resist composition and patterning process using the same

Polymers, positive resist compositions and patterning process

Resist composition and patterning process

Polymer, resist composition and patterning process

Silacyclohexane compounds, preparation thereof liquid crystal compositions comprising the same, and liquid crystal devices comprising the composition

Alcoholic hydroxyl-containing compounds and making method

Silicon-containing polymer, resist composition and patterning process

Resist composition and patterning process

Preparation process of chemically amplified resist composition

Silacyclohexane compound, a process for producing the same, and a liquid crystal composition comprising the same

TAKEDA TAKANOBU

Chemically amplified negative resist composition and patterning process

Chemically-amplified positive resist composition and patterning process thereof

Adhesive composition and adhesive dry film

Epoxy-containing polymer, photo-curable resin composition, patterning process, and electric/electronic part protective film

Resist patterning process and manufacturing photo mask

Synthesis of photoresist polymer

SHIN ETSU CHEMICAL C LTD

Positive resist compositions and patterning process

FUJIFILM CORP

Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device

ASAI SATOSHI

Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts

SHIN ETU CHEMICAL CO LTD

Chemical amplification, positive resist compositions

TAGAMI SHOHEI

Polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation

SOGA KYOKO

Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film

TANAKA AKINOBU

Chemically amplified positive resist composition and resist patterning process

SHI ETSU CHEMICAL CO LTD

Chemical amplification, positive resist compositions

YASUDA HIROYUKI

Silphenylene skeleton-containing silicone type polymer and method for manufacturing the same