Inventor
THEES HANS-JUERGEN
DE30 patents
⚠️ This page may combine multiple inventors who share the name “THEES HANS-JUERGEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
GLOBALFOUNDRIES INC
11 patentsUS9634088B1Apr 25, 2017
Junction formation with reduced CEFF for 22NM FDSOI devices
GLOBALFOUNDRIES INC7 citations84
US9634017B1Apr 25, 2017
Semiconductor structure including a nonvolatile memory cell and method for the formation thereof
GLOBALFOUNDRIES INC12 citations84
US9673210B1Jun 6, 2017
Semiconductor structure including a nonvolatile memory cell having a charge trapping layer and method for the formation thereof
GLOBALFOUNDRIES INC18 citations83
US9793294B1Oct 17, 2017
Junction formation with reduced Ceff for 22nm FDSOI devices
GLOBALFOUNDRIES INC4 citations73
US9953876B1Apr 24, 2018
Method of forming a semiconductor device structure and semiconductor device structure
GLOBALFOUNDRIES INC2 citations72
US10707330B2Jul 7, 2020
Semiconductor device with interconnect to source/drain
GLOBALFOUNDRIES INC1 citations62
US10475901B1Nov 12, 2019
Cap removal for gate electrode structures with reduced complexity
GLOBALFOUNDRIES INC1 citations62
US9214463B2Dec 15, 2015
Methods of forming metal silicide regions on a semiconductor device
GLOBALFOUNDRIES INC0 citations52
US9761689B2Sep 12, 2017
Method of forming a semiconductor device and according semiconductor device
GLOBALFOUNDRIES INC0 citations50
US9372392B2Jun 21, 2016
Reticles for use in forming implant masking layers and methods of forming implant masking layers
GLOBALFOUNDRIES INC0 citations48
US10062619B2Aug 28, 2018
Air gap spacer implant for NZG reliability fix
GLOBALFOUNDRIES INC0 citations42
INFINEON TECHNOLOGIES AG
6 patentsUS11195942B2Dec 7, 2021
Semiconductor device including electrode trench structure and isolation trench structure and manufacturing method therefore
INFINEON TECHNOLOGIES AG0 citations62
US12266718B2Apr 1, 2025
Voltage-controlled switching device with channel region
INFINEON TECHNOLOGIES AG0 citations61
US11728420B2Aug 15, 2023
Mesa contact for a power semiconductor device and method of producing a power semiconductor device
INFINEON TECHNOLOGIES AG0 citations52
US10971599B2Apr 6, 2021
Power semiconductor device with self-aligned source region
INFINEON TECHNOLOGIES AG0 citations51
US12501669B2Dec 16, 2025
Mesa contact for MOS controlled power semiconductor device
INFINEON TECHNOLOGIES AG0 citations46
US11742417B2Aug 29, 2023
Power semiconductor device including first and second trench structures
INFINEON TECHNOLOGIES AG0 citations46
THEES HANS-JUERGEN
5 patentsUS8748275B2Jun 10, 2014
Semiconductor devices comprising a channel semiconductor alloy formed with reduced STI topography
THEES HANS-JUERGEN11 citations83
US8735303B2May 27, 2014
Methods of forming PEET devices with different structures and performance characteristics
THEES HANS-JUERGEN2 citations61
US8859356B2Oct 14, 2014
Method of forming metal silicide regions on a semiconductor device
THEES HANS-JUERGEN0 citations51
US8722479B2May 13, 2014
Method of protecting STI structures from erosion during processing operations
THEES HANS-JUERGEN0 citations50
US9281200B2Mar 8, 2016
Enhanced patterning uniformity of gate electrodes of a semiconductor device by late gate doping
THEES HANS-JUERGEN0 citations37
KRONHOLZ STEPHAN
3 patentsUS8796080B2Aug 5, 2014
Methods of epitaxially forming materials on transistor devices
KRONHOLZ STEPHAN4 citations73
US8642419B2Feb 4, 2014
Methods of forming isolation structures for semiconductor devices
KRONHOLZ STEPHAN4 citations71
US8987144B2Mar 24, 2015
High-K metal gate electrode structures formed by cap layer removal without sacrificial spacer
KRONHOLZ STEPHAN0 citations41