P

Inventor

SENGUPTA RWIK

US43 patents
⚠️ This page may combine multiple inventors who share the name “SENGUPTA RWIK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

37 patents
US9570395B1Feb 14, 2017

Semiconductor device having buried power rail

SAMSUNG ELECTRONICS CO LTD94 citations97
US9287357B2Mar 15, 2016

Integrated circuits with Si and non-Si nanosheet FET co-integration with low band-to-band tunneling and methods of fabricating the same

SAMSUNG ELECTRONICS CO LTD66 citations97
US9490323B2Nov 8, 2016

Nanosheet FETs with stacked nanosheets having smaller horizontal spacing than vertical spacing for large effective width

SAMSUNG ELECTRONICS CO LTD37 citations94
US11461620B2Oct 4, 2022

Multi-bit, SoC-compatible neuromorphic weight cell using ferroelectric FETs

SAMSUNG ELECTRONICS CO LTD5 citations84
US10985103B2Apr 20, 2021

Apparatus and method of forming backside buried conductor in integrated circuit

SAMSUNG ELECTRONICS CO LTD8 citations84
US10811415B2Oct 20, 2020

Semiconductor device and method for making the same

SAMSUNG ELECTRONICS CO LTD10 citations84
US10164121B2Dec 25, 2018

Stacked independently contacted field effect transistor having electrically separated first and second gates

SAMSUNG ELECTRONICS CO LTD8 citations84
US9466669B2Oct 11, 2016

Multiple channel length finFETs with same physical gate length

SAMSUNG ELECTRONICS CO LTD16 citations84
US9685564B2Jun 20, 2017

Gate-all-around field effect transistors with horizontal nanosheet conductive channel structures for MOL/inter-channel spacing and related cell architectures

SAMSUNG ELECTRONICS CO LTD13 citations83
US9324715B2Apr 26, 2016

Flip-flop layout architecture implementation for semiconductor device

SAMSUNG ELECTRONICS CO LTD16 citations83
US10886224B2Jan 5, 2021

Power distribution network using buried power rail

SAMSUNG ELECTRONICS CO LTD17 citations82
US10566330B2Feb 18, 2020

Dielectric separation of partial GAA FETs

SAMSUNG ELECTRONICS CO LTD10 citations82
US9768062B1Sep 19, 2017

Method for forming low parasitic capacitance source and drain contacts

SAMSUNG ELECTRONICS CO LTD8 citations80
US11189692B2Nov 30, 2021

VFET standard cell architecture with improved contact and super via

SAMSUNG ELECTRONICS CO LTD2 citations73
US10910313B2Feb 2, 2021

Integrated circuit including field effect transistors having a contact on active gate compatible with a small cell area having a small contacted poly pitch

SAMSUNG ELECTRONICS CO LTD5 citations73
US10381315B2Aug 13, 2019

Method and system for providing a reverse-engineering resistant hardware embedded security module

SAMSUNG ELECTRONICS CO LTD2 citations73
US10026751B2Jul 17, 2018

Semiconductor device including a repeater/buffer at higher metal routing layers and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD4 citations73
US9443851B2Sep 13, 2016

Semiconductor devices including finFETs and local interconnect layers and methods of fabricating the same

SAMSUNG ELECTRONICS CO LTD5 citations73
US10153368B2Dec 11, 2018

Unipolar complementary logic

SAMSUNG ELECTRONICS CO LTD2 citations72
US9659871B2May 23, 2017

Semiconductor device

SAMSUNG ELECTRONICS CO LTD4 citations72
US11552067B2Jan 10, 2023

Semiconductor cell blocks having non-integer multiple of cell heights

SAMSUNG ELECTRONICS CO LTD2 citations70
US10784198B2Sep 22, 2020

Power rail for standard cell block

SAMSUNG ELECTRONICS CO LTD2 citations69
US9490263B2Nov 8, 2016

Semiconductor device and method of forming the same

SAMSUNG ELECTRONICS CO LTD6 citations68
US12046635B2Jul 23, 2024

VFET standard cell architecture with improved contact and super via

SAMSUNG ELECTRONICS CO LTD0 citations63
US11727258B2Aug 15, 2023

Multi-bit, SoC-compatible neuromorphic weight cell using ferroelectric FETs

SAMSUNG ELECTRONICS CO LTD0 citations62
US11182686B2Nov 23, 2021

4T4R ternary weight cell with high on/off ratio background

SAMSUNG ELECTRONICS CO LTD0 citations62
US10916513B2Feb 9, 2021

Method and system for providing a reverse engineering resistant hardware embedded security module

SAMSUNG ELECTRONICS CO LTD0 citations62
US10861950B2Dec 8, 2020

Integrated circuit including field effect transistors having a contact on active gate compatible with a small cell area having a small contacted poly pitch

SAMSUNG ELECTRONICS CO LTD1 citations62
US11101320B2Aug 24, 2021

System and method for efficient enhancement of an on/off ratio of a bitcell based on 3T2R binary weight cell with spin orbit torque MJTs (SOT-MTJs)

SAMSUNG ELECTRONICS CO LTD1 citations61
US10424581B2Sep 24, 2019

Sub 59 MV/decade SI CMOS compatible tunnel FET as footer transistor for power gating

SAMSUNG ELECTRONICS CO LTD0 citations52
US9691860B2Jun 27, 2017

Methods of forming defect-free SRB onto lattice-mismatched substrates and defect-free fins on insulators

SAMSUNG ELECTRONICS CO LTD0 citations52
US10872662B2Dec 22, 2020

2T2R binary weight cell with high on/off ratio background

SAMSUNG ELECTRONICS CO LTD0 citations51
US10832774B2Nov 10, 2020

Variation resistant 3T3R binary weight cell with low output current and high on/off ratio

SAMSUNG ELECTRONICS CO LTD0 citations51
US9929180B2Mar 27, 2018

Semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations51
US12080703B2Sep 3, 2024

Semiconductor cell blocks having non-integer multiple of cell heights

SAMSUNG ELECTRONICS CO LTD0 citations49
US10868193B2Dec 15, 2020

Nanosheet field effect transistor cell architecture

SAMSUNG ELECTRONICS CO LTD0 citations41
US9728502B2Aug 8, 2017

Metal oxysilicate diffusion barriers for damascene metallization with low RC delays and methods for forming the same

SAMSUNG ELECTRONICS CO LTD0 citations40

CADENCE DESIGN SYSTEMS INC

3 patents

SENGUPTA RWIK

2 patents

KITTL JORGE A

1 patent