Inventor
SENGUPTA RWIK
US43 patents
⚠️ This page may combine multiple inventors who share the name “SENGUPTA RWIK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
37 patentsUS9570395B1Feb 14, 2017
Semiconductor device having buried power rail
SAMSUNG ELECTRONICS CO LTD94 citations97
US9287357B2Mar 15, 2016
Integrated circuits with Si and non-Si nanosheet FET co-integration with low band-to-band tunneling and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD66 citations97
US9490323B2Nov 8, 2016
Nanosheet FETs with stacked nanosheets having smaller horizontal spacing than vertical spacing for large effective width
SAMSUNG ELECTRONICS CO LTD37 citations94
US11461620B2Oct 4, 2022
Multi-bit, SoC-compatible neuromorphic weight cell using ferroelectric FETs
SAMSUNG ELECTRONICS CO LTD5 citations84
US10985103B2Apr 20, 2021
Apparatus and method of forming backside buried conductor in integrated circuit
SAMSUNG ELECTRONICS CO LTD8 citations84
US10811415B2Oct 20, 2020
Semiconductor device and method for making the same
SAMSUNG ELECTRONICS CO LTD10 citations84
US10164121B2Dec 25, 2018
Stacked independently contacted field effect transistor having electrically separated first and second gates
SAMSUNG ELECTRONICS CO LTD8 citations84
US9466669B2Oct 11, 2016
Multiple channel length finFETs with same physical gate length
SAMSUNG ELECTRONICS CO LTD16 citations84
US9685564B2Jun 20, 2017
Gate-all-around field effect transistors with horizontal nanosheet conductive channel structures for MOL/inter-channel spacing and related cell architectures
SAMSUNG ELECTRONICS CO LTD13 citations83
US9324715B2Apr 26, 2016
Flip-flop layout architecture implementation for semiconductor device
SAMSUNG ELECTRONICS CO LTD16 citations83
US10886224B2Jan 5, 2021
Power distribution network using buried power rail
SAMSUNG ELECTRONICS CO LTD17 citations82
US10566330B2Feb 18, 2020
Dielectric separation of partial GAA FETs
SAMSUNG ELECTRONICS CO LTD10 citations82
US9768062B1Sep 19, 2017
Method for forming low parasitic capacitance source and drain contacts
SAMSUNG ELECTRONICS CO LTD8 citations80
US11189692B2Nov 30, 2021
VFET standard cell architecture with improved contact and super via
SAMSUNG ELECTRONICS CO LTD2 citations73
US10910313B2Feb 2, 2021
Integrated circuit including field effect transistors having a contact on active gate compatible with a small cell area having a small contacted poly pitch
SAMSUNG ELECTRONICS CO LTD5 citations73
US10381315B2Aug 13, 2019
Method and system for providing a reverse-engineering resistant hardware embedded security module
SAMSUNG ELECTRONICS CO LTD2 citations73
US10026751B2Jul 17, 2018
Semiconductor device including a repeater/buffer at higher metal routing layers and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD4 citations73
US9443851B2Sep 13, 2016
Semiconductor devices including finFETs and local interconnect layers and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD5 citations73
US10153368B2Dec 11, 2018
Unipolar complementary logic
SAMSUNG ELECTRONICS CO LTD2 citations72
US9659871B2May 23, 2017
Semiconductor device
SAMSUNG ELECTRONICS CO LTD4 citations72
US11552067B2Jan 10, 2023
Semiconductor cell blocks having non-integer multiple of cell heights
SAMSUNG ELECTRONICS CO LTD2 citations70
US10784198B2Sep 22, 2020
Power rail for standard cell block
SAMSUNG ELECTRONICS CO LTD2 citations69
US9490263B2Nov 8, 2016
Semiconductor device and method of forming the same
SAMSUNG ELECTRONICS CO LTD6 citations68
US12046635B2Jul 23, 2024
VFET standard cell architecture with improved contact and super via
SAMSUNG ELECTRONICS CO LTD0 citations63
US11727258B2Aug 15, 2023
Multi-bit, SoC-compatible neuromorphic weight cell using ferroelectric FETs
SAMSUNG ELECTRONICS CO LTD0 citations62
US11182686B2Nov 23, 2021
4T4R ternary weight cell with high on/off ratio background
SAMSUNG ELECTRONICS CO LTD0 citations62
US10916513B2Feb 9, 2021
Method and system for providing a reverse engineering resistant hardware embedded security module
SAMSUNG ELECTRONICS CO LTD0 citations62
US10861950B2Dec 8, 2020
Integrated circuit including field effect transistors having a contact on active gate compatible with a small cell area having a small contacted poly pitch
SAMSUNG ELECTRONICS CO LTD1 citations62
US11101320B2Aug 24, 2021
System and method for efficient enhancement of an on/off ratio of a bitcell based on 3T2R binary weight cell with spin orbit torque MJTs (SOT-MTJs)
SAMSUNG ELECTRONICS CO LTD1 citations61
US10424581B2Sep 24, 2019
Sub 59 MV/decade SI CMOS compatible tunnel FET as footer transistor for power gating
SAMSUNG ELECTRONICS CO LTD0 citations52
US9691860B2Jun 27, 2017
Methods of forming defect-free SRB onto lattice-mismatched substrates and defect-free fins on insulators
SAMSUNG ELECTRONICS CO LTD0 citations52
US10872662B2Dec 22, 2020
2T2R binary weight cell with high on/off ratio background
SAMSUNG ELECTRONICS CO LTD0 citations51
US10832774B2Nov 10, 2020
Variation resistant 3T3R binary weight cell with low output current and high on/off ratio
SAMSUNG ELECTRONICS CO LTD0 citations51
US9929180B2Mar 27, 2018
Semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations51
US12080703B2Sep 3, 2024
Semiconductor cell blocks having non-integer multiple of cell heights
SAMSUNG ELECTRONICS CO LTD0 citations49
US10868193B2Dec 15, 2020
Nanosheet field effect transistor cell architecture
SAMSUNG ELECTRONICS CO LTD0 citations41
US9728502B2Aug 8, 2017
Metal oxysilicate diffusion barriers for damascene metallization with low RC delays and methods for forming the same
SAMSUNG ELECTRONICS CO LTD0 citations40
CADENCE DESIGN SYSTEMS INC
3 patentsUS11574111B1Feb 7, 2023
Electronic design tracing and tamper detection using automatically generated layout patterns
CADENCE DESIGN SYSTEMS INC3 citations68
US11868698B1Jan 9, 2024
Context-aware circuit design layout construct
CADENCE DESIGN SYSTEMS INC1 citations55
US11354470B1Jun 7, 2022
System and method for device placement
CADENCE DESIGN SYSTEMS INC0 citations51