Inventor
OGASAWARA MASAHIRO
JP30 patents
⚠️ This page may combine multiple inventors who share the name “OGASAWARA MASAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
18 patentsUS5997962ADec 7, 1999
Plasma process utilizing an electrostatic chuck
TOKYO ELECTRON LTD253 citations99
US5919332AJul 6, 1999
Plasma processing apparatus
TOKYO ELECTRON LTD445 citations98
US5356515AOct 18, 1994
Dry etching method
TOKYO ELECTRON LTD139 citations97
US5770098AJun 23, 1998
Etching process
TOKYO ELECTRON LTD144 citations95
US5494522AFeb 27, 1996
Plasma process system and method
TOKYO ELECTRON LTD90 citations95
US9865471B2Jan 9, 2018
Etching method and etching apparatus
TOKYO ELECTRON LTD43 citations92
US7255773B2Aug 14, 2007
Plasma processing apparatus and evacuation ring
TOKYO ELECTRON LTD33 citations92
US6878234B2Apr 12, 2005
Plasma processing device and exhaust ring
TOKYO ELECTRON LTD25 citations92
US5411624AMay 2, 1995
Magnetron plasma processing apparatus
TOKYO ELECTRON LTD54 citations92
US7506610B2Mar 24, 2009
Plasma processing apparatus and method
TOKYO ELECTRON LTD15 citations84
US7494561B2Feb 24, 2009
Plasma processing apparatus and method, and electrode plate for plasma processing apparatus
TOKYO ELECTRON LTD12 citations84
US7351665B2Apr 1, 2008
Plasma etching method, plasma etching apparatus, control program, computer recording medium and recording medium having processing recipe recorded thereon
TOKYO ELECTRON LTD2 citations63
US11257662B2Feb 22, 2022
Annular member, plasma processing apparatus and plasma etching method
TOKYO ELECTRON LTD0 citations61
US11404279B2Aug 2, 2022
Etching method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations59
US9257301B2Feb 9, 2016
Method of etching silicon oxide film
TOKYO ELECTRON LTD0 citations52
US9716014B2Jul 25, 2017
Method of processing workpiece
TOKYO ELECTRON LTD0 citations51
US9530657B2Dec 27, 2016
Method of processing substrate and substrate processing apparatus
TOKYO ELECTRON LTD0 citations50
US7300881B2Nov 27, 2007
Plasma etching method
TOKYO ELECTRON LTD1 citations49
OGASAWARA MASAHIRO
4 patentsUS11389617B2Jul 19, 2022
Sleep induction device and sleep induction method
OGASAWARA MASAHIRO1 citations61
US8298960B2Oct 30, 2012
Plasma etching method, control program and computer storage medium
OGASAWARA MASAHIRO2 citations61
US8642482B2Feb 4, 2014
Plasma etching method, control program and computer storage medium
OGASAWARA MASAHIRO0 citations50
US8815106B2Aug 26, 2014
Method of supplying etching gas and etching apparatus
OGASAWARA MASAHIRO0 citations39