Inventor
MATSUMIYA TASUKU
JP33 patents
⚠️ This page may combine multiple inventors who share the name “MATSUMIYA TASUKU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
22 patentsUS9169421B2Oct 27, 2015
Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material
TOKYO OHKA KOGYO CO LTD7 citations82
US9567477B2Feb 14, 2017
Undercoat agent and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD4 citations73
US9816003B2Nov 14, 2017
Method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD2 citations72
US8846838B2Sep 30, 2014
Fluorine-containing block copolymeric compound
TOKYO OHKA KOGYO CO LTD2 citations63
US9442371B2Sep 13, 2016
Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US9206307B2Dec 8, 2015
Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US7449276B2Nov 11, 2008
Positive photoresist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD2 citations61
US8043798B2Oct 25, 2011
Method of forming fine patterns
TOKYO OHKA KOGYO CO LTD0 citations52
US7923192B2Apr 12, 2011
Base material for pattern-forming material, positive resist composition and method of resist pattern formation
TOKYO OHKA KOGYO CO LTD1 citations52
US12411408B2Sep 9, 2025
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations51
US11835857B2Dec 5, 2023
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations51
US9914847B2Mar 13, 2018
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations51
US8367296B2Feb 5, 2013
Positive resist composition, method of forming resist pattern, and polymeric compound
TOKYO OHKA KOGYO CO LTD0 citations42
US10100221B2Oct 16, 2018
Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer composition
TOKYO OHKA KOGYO CO LTD0 citations41
US10066096B2Sep 4, 2018
Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations41
US9821338B2Nov 21, 2017
Method of producing structure containing phase-separated structure utilizing a brush composition comprising PS-PMMA
TOKYO OHKA KOGYO CO LTD0 citations41
US9776208B2Oct 3, 2017
Brush composition, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations41
US7871753B2Jan 18, 2011
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations41
US10179866B2Jan 15, 2019
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations40
US9834696B2Dec 5, 2017
Undercoat agent and method of forming pattern of layer containing block copolymer
TOKYO OHKA KOGYO CO LTD0 citations40
US9828519B2Nov 28, 2017
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations40
US9475088B2Oct 25, 2016
Method of producing structure containing phase-separated structure, phase separated structure, and block copolymer composition
TOKYO OHKA KOGYO CO LTD0 citations40
DAZAI TAKAHIRO
6 patentsUS8192915B2Jun 5, 2012
Positive resist composition, method of forming resist pattern, and polymeric compound
DAZAI TAKAHIRO21 citations92
US8232041B2Jul 31, 2012
Positive resist composition, method of forming resist pattern, and polymeric compound
DAZAI TAKAHIRO12 citations84
US8182976B2May 22, 2012
Positive resist composition, method of forming resist pattern, and polymeric compound
DAZAI TAKAHIRO13 citations84
US8268529B2Sep 18, 2012
Positive resist composition, method of forming resist pattern using the same, and polymeric compound
DAZAI TAKAHIRO9 citations83
US8227170B2Jul 24, 2012
Resist composition, method of forming resist pattern, polymeric compound, and compound
DAZAI TAKAHIRO11 citations83
US8541529B2Sep 24, 2013
Positive resist composition, method of forming resist pattern, and polymeric compound
DAZAI TAKAHIRO3 citations62
MATSUMIYA TASUKU
3 patentsUS8236477B2Aug 7, 2012
Positive resist composition and method of forming resist pattern
MATSUMIYA TASUKU7 citations82
US8487056B2Jul 16, 2013
Positive resist composition and method of forming resist pattern
MATSUMIYA TASUKU4 citations61
US8404428B2Mar 26, 2013
Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound
MATSUMIYA TASUKU3 citations61