Inventor
KUROSAWA TSUYOSHI
JP22 patents
⚠️ This page may combine multiple inventors who share the name “KUROSAWA TSUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
13 patentsUS8349534B2Jan 8, 2013
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD8 citations84
US7927780B2Apr 19, 2011
Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
TOKYO OHKA KOGYO CO LTD9 citations83
US9169421B2Oct 27, 2015
Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material
TOKYO OHKA KOGYO CO LTD7 citations82
US8795947B2Aug 5, 2014
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations73
US9816003B2Nov 14, 2017
Method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD2 citations72
US11718772B2Aug 8, 2023
Curable composition, and production method of joined structure
TOKYO OHKA KOGYO CO LTD0 citations62
US9442371B2Sep 13, 2016
Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US10100221B2Oct 16, 2018
Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer composition
TOKYO OHKA KOGYO CO LTD0 citations41
US10066096B2Sep 4, 2018
Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations41
US9821338B2Nov 21, 2017
Method of producing structure containing phase-separated structure utilizing a brush composition comprising PS-PMMA
TOKYO OHKA KOGYO CO LTD0 citations41
US9776208B2Oct 3, 2017
Brush composition, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations41
US9834696B2Dec 5, 2017
Undercoat agent and method of forming pattern of layer containing block copolymer
TOKYO OHKA KOGYO CO LTD0 citations40
US9475088B2Oct 25, 2016
Method of producing structure containing phase-separated structure, phase separated structure, and block copolymer composition
TOKYO OHKA KOGYO CO LTD0 citations40
KUROSAWA TSUYOSHI
3 patentsUS8142979B2Mar 27, 2012
Resist composition for immersion exposure and method of forming resist pattern using the same
KUROSAWA TSUYOSHI2 citations60
US8518629B2Aug 27, 2013
Resist composition for immersion exposure and method of forming resist pattern using the same
KUROSAWA TSUYOSHI0 citations49
US9494860B2Nov 15, 2016
Resist composition, method of forming resist pattern
KUROSAWA TSUYOSHI0 citations38
SHIONO DAIJU
2 patentsUS8221956B2Jul 17, 2012
Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound
SHIONO DAIJU20 citations91
US8475997B2Jul 2, 2013
Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound
SHIONO DAIJU2 citations61