Inventor
YOU GEN
JP18 patents
⚠️ This page may combine multiple inventors who share the name “YOU GEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
13 patentsUS10046370B2Aug 14, 2018
Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium
TOKYO ELECTRON LTD3 citations73
US9662685B2May 30, 2017
Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium
TOKYO ELECTRON LTD5 citations73
US9583330B2Feb 28, 2017
Supercritical drying method for semiconductor substrate and supercritical drying apparatus
TOKYO ELECTRON LTD2 citations73
US10418242B2Sep 17, 2019
Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers
TOKYO ELECTRON LTD2 citations71
US10207349B2Feb 19, 2019
High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure container
TOKYO ELECTRON LTD1 citations62
US12575352B2Mar 10, 2026
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations61
US11574812B2Feb 7, 2023
Computer storage medium to perform a substrate treatment method using a block copolymer containing a hydrophilic and hydrophobic copolymers
TOKYO ELECTRON LTD0 citations61
US12283489B2Apr 22, 2025
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations60
US12272541B2Apr 8, 2025
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations59
US11764070B2Sep 19, 2023
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations49
US9741583B2Aug 22, 2017
Substrate treatment method, computer readable storage medium and substrate treatment system
TOKYO ELECTRON LTD0 citations41
US10329144B2Jun 25, 2019
Substrate treatment method, computer storage medium and substrate treatment system
TOKYO ELECTRON LTD0 citations40
US9911621B2Mar 6, 2018
Method for processing target object
TOKYO ELECTRON LTD0 citations37