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Inventor
OOKAWA YOSHIHITO
JP
2 patents
Patents
2 patents
US6758941B1
Jul 6, 2004
Plasma processing unit, window member for plasma processing unit and electrode plate for plasma processing unit
TOKYO ELECTRON LTD
38 citations
89
US6448094B2
Sep 10, 2002
Method of detecting etching depth
TOKYO ELECTRON LTD
15 citations
81