Inventor
CHO HUNG-WEN
TW10 patents
Patents
10 patentsUS10642158B2May 5, 2020
Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10366973B2Jul 30, 2019
Layout modification method for exposure manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11594528B2Feb 28, 2023
Layout modification method for exposure manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11150561B2Oct 19, 2021
Method and apparatus for collecting information used in image-error compensation
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11024623B2Jun 1, 2021
Layout modification method for exposure manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10871713B2Dec 22, 2020
Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US10712651B2Jul 14, 2020
Method and apparatus for collecting information used in image-error compensation
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12572080B2Mar 10, 2026
Lithography system and methods
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US10720419B2Jul 21, 2020
Layout modification method for exposure manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10276375B2Apr 30, 2019
Assistant pattern for measuring critical dimension of main pattern in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations35