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Inventor
UH KYUNGCHAN
KR
1 patents
Patents
1 patent
US11131925B2
Sep 28, 2021
Water-soluble diacetylene, photolithography composition comprising water-soluble diacetylene monomer and conductive polymer, and fine pattern preparation method using same
UNIV HANYANG IND UNIV COOP FOUND
0 citations
55