Inventor
NAKAGAWA KENJI
69 patents
⚠️ This page may combine multiple inventors who share the name “NAKAGAWA KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
25 patentsUS5364716ANov 15, 1994
Pattern exposing method using phase shift and mask used therefor
FUJITSU LTD116 citations97
US5465220ANov 7, 1995
Optical exposure method
FUJITSU LTD55 citations96
US5489509AFeb 6, 1996
Mask, mask producing method and pattern forming method using mask
FUJITSU LTD40 citations95
US6555922B1Apr 29, 2003
IC bonding pad combined with mark or monitor
FUJITSU LTD21 citations93
US4881257ANov 14, 1989
Deformation free X-ray exposure mask for X-ray lithography
FUJITSU LTD25 citations93
US6045976AApr 4, 2000
Optical exposure method
FUJITSU LTD29 citations92
US5607821AMar 4, 1997
Optical exposure method
FUJITSU LTD18 citations92
US5472813ADec 5, 1995
Pattern exposing method using phase shift and mask used therefor
FUJITSU LTD24 citations92
US5415952AMay 16, 1995
Fine pattern lithography with positive use of interference
FUJITSU LTD22 citations92
US6093511AJul 25, 2000
Method of manufacturing semiconductor device
FUJITSU LTD20 citations84
US6420094B1Jul 16, 2002
Optical exposure method
FUJITSU LTD13 citations82
US5637424AJun 10, 1997
Fine pattern lithography with positive use of interference
FUJITSU LTD16 citations82
US5786115AJul 28, 1998
Mask producing method
FUJITSU LTD13 citations81
US5082695AJan 21, 1992
Method of fabricating an x-ray exposure mask
FUJITSU LTD19 citations81
US6127098AOct 3, 2000
Method of making resist patterns
FUJITSU LTD12 citations74
US5514498AMay 7, 1996
Reticle with phase-shifters and a method of fabricating the same
FUJITSU LTD10 citations74
US5338647AAug 16, 1994
Reflection type photomask and reflection type photolithography method comprising a concavo-convex surface
FUJITSU LTD13 citations74
US5276551AJan 4, 1994
Reticle with phase-shifters and a method of fabricating the same
FUJITSU LTD13 citations74
US5190836AMar 2, 1993
Reflection type photomask with phase shifter
FUJITSU LTD13 citations74
US5004927AApr 2, 1991
Process for forming a fine pattern having a high aspect ratio
FUJITSU LTD10 citations74
US4939052AJul 3, 1990
X-ray exposure mask
FUJITSU LTD13 citations74
US4678919AJul 7, 1987
Electron beam exposure method and apparatus
FUJITSU LTD9 citations74
US5674646AOct 7, 1997
Mask producing method
FUJITSU LTD9 citations73
US5624791AApr 29, 1997
Pattern forming method using mask
FUJITSU LTD7 citations73
US5863709AJan 26, 1999
Deep UV photolithography with reduced halation
FUJITSU LTD2 citations63
MISUMI CORP
5 patentsUS11715307B2Aug 1, 2023
Support method, server, and design support system
MISUMI CORP4 citations74
US11721082B2Aug 8, 2023
Assistance device, design assistance system, server, and design assistance method
MISUMI CORP0 citations62
US11704915B2Jul 18, 2023
Support method, server, and design support system
MISUMI CORP0 citations62
US11074761B2Jul 27, 2021
Assistance device, design assistance system, server, and design assistance method
MISUMI CORP0 citations62
US10956710B2Mar 23, 2021
Support method, server, and design support system
MISUMI CORP0 citations62
HOYA CORP
3 patentsUS4643982AFeb 17, 1987
High-strength glass-ceramic containing anorthite crystals and process for producing the same
HOYA CORP59 citations96
US4560666ADec 24, 1985
High strength glass-ceramic containing apatite and alkaline earth metal silicate crystals and process for producing the same
HOYA CORP50 citations93
US4391916AJul 5, 1983
Alkali-free glass for photoetching mask
HOYA CORP7 citations74
HOYA GLASS WORKS LTD
3 patentsAUTONETWORKS TECHNOLOGIES LTD
3 patentsSANYO ELECTRIC CO
2 patentsTOYOTA MOTOR CO LTD
2 patentsFUKUDA METAL FOIL POWDER
1 patentDDK LTD
1 patentOTIS ELEVATOR CO
1 patentKAWASAKI STEEL CO
1 patentHITACHI SHIPBUILDING ENG CO
1 patentSAKAGUCHI KIYOFUMI
1 patentVISION PSYTEC CO LTD
1 patentShowing the top 50 of 69 patents by PatentIndex Score.