Inventor
LEVINSTEIN HYMAN J
27 patents
⚠️ This page may combine multiple inventors who share the name “LEVINSTEIN HYMAN J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
BELL TELEPHONE LABOR INC
15 patentsUS4427516AJan 24, 1984
Apparatus and method for plasma-assisted etching of wafers
BELL TELEPHONE LABOR INC82 citations96
US4419201ADec 6, 1983
Apparatus and method for plasma-assisted etching of wafers
BELL TELEPHONE LABOR INC55 citations96
US4378628AApr 5, 1983
Cobalt silicide metallization for semiconductor integrated circuits
BELL TELEPHONE LABOR INC105 citations96
US4276557AJun 30, 1981
Integrated semiconductor circuit structure and method for making it
BELL TELEPHONE LABOR INC59 citations96
US4256534AMar 17, 1981
Device fabrication by plasma etching
BELL TELEPHONE LABOR INC57 citations96
US4151007AApr 24, 1979
Hydrogen annealing process for stabilizing metal-oxide-semiconductor structures
BELL TELEPHONE LABOR INC51 citations96
US4208241AJun 17, 1980
Device fabrication by plasma etching
BELL TELEPHONE LABOR INC59 citations94
US4343677AAug 10, 1982
Method for patterning films using reactive ion etching thereof
BELL TELEPHONE LABOR INC58 citations93
US4332839AJun 1, 1982
Method for making integrated semiconductor circuit structure with formation of Ti or Ta silicide
BELL TELEPHONE LABOR INC30 citations92
US4149905AApr 17, 1979
Method of limiting stacking faults in oxidized silicon wafers
BELL TELEPHONE LABOR INC35 citations91
US4134125AJan 9, 1979
Passivation of metallized semiconductor substrates
BELL TELEPHONE LABOR INC36 citations90
US4341818AJul 27, 1982
Method for producing silicon dioxide/polycrystalline silicon interfaces
BELL TELEPHONE LABOR INC25 citations81
US4171489AOct 16, 1979
Radiation mask structure
BELL TELEPHONE LABOR INC27 citations81
US4253029AFeb 24, 1981
Mask structure for x-ray lithography
BELL TELEPHONE LABOR INC18 citations74
US4323638AApr 6, 1982
Reducing charging effects in charged-particle-beam lithography
BELL TELEPHONE LABOR INC17 citations69
APPLIED MATERIALS INC
7 patentsUS5745331AApr 28, 1998
Electrostatic chuck with conformal insulator film
APPLIED MATERIALS INC166 citations99
US5753132AMay 19, 1998
Method of making electrostatic chuck with conformal insulator film
APPLIED MATERIALS INC78 citations96
US5585012ADec 17, 1996
Self-cleaning polymer-free top electrode for parallel electrode etch operation
APPLIED MATERIALS INC52 citations96
US5491603AFeb 13, 1996
Method of determining a dechucking voltage which nullifies a residual electrostatic force between an electrostatic chuck and a wafer
APPLIED MATERIALS INC77 citations96
US5986875ANov 16, 1999
Puncture resistant electrostatic chuck
APPLIED MATERIALS INC42 citations95
US5729423AMar 17, 1998
Puncture resistant electrostatic chuck
APPLIED MATERIALS INC57 citations95
US6217655B1Apr 17, 2001
Stand-off pad for supporting a wafer on a substrate support chuck
APPLIED MATERIALS INC23 citations93
AT & T BELL LAB
4 patentsUS4555842ADec 3, 1985
Method of fabricating VLSI CMOS devices having complementary threshold voltages
AT & T BELL LAB49 citations92
US4472237ASep 18, 1984
Reactive ion etching of tantalum and silicon
AT & T BELL LAB30 citations89
US4522842AJun 11, 1985
Boron nitride X-ray masks with controlled stress
AT & T BELL LAB16 citations73
US4985373AJan 15, 1991
Multiple insulating layer for two-level interconnected metallization in semiconductor integrated circuit structures
AT & T BELL LAB14 citations69