P

Inventor

ISHII NOBUO

JP67 patents
⚠️ This page may combine multiple inventors who share the name “ISHII NOBUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

45 patents
US7243610B2Jul 17, 2007

Plasma device and plasma generating method

TOKYO ELECTRON LTD226 citations99
US6528752B1Mar 4, 2003

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD388 citations99
US6433298B1Aug 13, 2002

Plasma processing apparatus

TOKYO ELECTRON LTD428 citations99
US5698036ADec 16, 1997

Plasma processing apparatus

TOKYO ELECTRON LTD502 citations99
US5571366ANov 5, 1996

Plasma processing apparatus

TOKYO ELECTRON LTD502 citations99
US5529657AJun 25, 1996

Plasma processing apparatus

TOKYO ELECTRON LTD335 citations99
US5851298ADec 22, 1998

Susceptor structure for mounting processing object thereon

TOKYO ELECTRON LTD132 citations98
US5685942ANov 11, 1997

Plasma processing apparatus and method

TOKYO ELECTRON LTD107 citations98
US5683537ANov 4, 1997

Plasma processing apparatus

TOKYO ELECTRON LTD98 citations98
US5342472AAug 30, 1994

Plasma processing apparatus

TOKYO ELECTRON LTD118 citations98
US5314541AMay 24, 1994

Reduced pressure processing system and reduced pressure processing method

TOKYO ELECTRON LTD127 citations98
US6347602B2Feb 19, 2002

Plasma processing apparatus

TOKYO ELECTRON LTD68 citations96
US6311638B1Nov 6, 2001

Plasma processing method and apparatus

TOKYO ELECTRON LTD73 citations96
US5874706AFeb 23, 1999

Microwave plasma processing apparatus using a hybrid microwave having two different modes of oscillation or branched microwaves forming a concentric electric field

TOKYO ELECTRON LTD77 citations96
US5795429AAug 18, 1998

Plasma processing apparatus

TOKYO ELECTRON LTD82 citations96
US5637961AJun 10, 1997

Concentric rings with different RF energies applied thereto

TOKYO ELECTRON LTD77 citations96
US5455082AOct 3, 1995

Reduced pressure processing system and reduced pressure processing method

TOKYO ELECTRON LTD69 citations95
US5701228ADec 23, 1997

Stage system or device

TOKYO ELECTRON LTD26 citations93
US5374327ADec 20, 1994

Plasma processing method

TOKYO ELECTRON LTD48 citations93
US5173641ADec 22, 1992

Plasma generating apparatus

TOKYO ELECTRON LTD35 citations93
US6847003B2Jan 25, 2005

Plasma processing apparatus

TOKYO ELECTRON LTD22 citations92
US6646224B2Nov 11, 2003

Plasma-assisted processing system and plasma-assisted processing method

TOKYO ELECTRON LTD21 citations92
US6622650B2Sep 23, 2003

Plasma processing apparatus

TOKYO ELECTRON LTD34 citations92
US6350347B1Feb 26, 2002

Plasma processing apparatus

TOKYO ELECTRON LTD14 citations92
US6136139AOct 24, 2000

Plasma processing apparatus

TOKYO ELECTRON LTD22 citations92
US6066568AMay 23, 2000

Plasma treatment method and system

TOKYO ELECTRON LTD21 citations91
US5783492AJul 21, 1998

Plasma processing method, plasma processing apparatus, and plasma generating apparatus

TOKYO ELECTRON LTD50 citations91
US6796268B2Sep 28, 2004

Microwave plasma processing system

TOKYO ELECTRON LTD19 citations84
US6322662B1Nov 27, 2001

Plasma treatment system

TOKYO ELECTRON LTD19 citations84
US6265031B1Jul 24, 2001

Method for plasma processing by shaping an induced electric field

TOKYO ELECTRON LTD12 citations82
US5938883AAug 17, 1999

Plasma processing apparatus

TOKYO ELECTRON LTD16 citations82
US7305934B2Dec 11, 2007

Plasma treatment apparatus and plasma generation method

TOKYO ELECTRON LTD8 citations74
US7023393B2Apr 4, 2006

Slot array antenna and plasma processing apparatus

TOKYO ELECTRON LTD7 citations74
US6657151B2Dec 2, 2003

Plasma processing device

TOKYO ELECTRON LTD10 citations74
US6501082B1Dec 31, 2002

Plasma deposition apparatus and method with controller

TOKYO ELECTRON LTD13 citations74
US6136140AOct 24, 2000

Plasma processing apparatus

TOKYO ELECTRON LTD15 citations74
US6024827AFeb 15, 2000

Plasma processing apparatus

TOKYO ELECTRON LTD14 citations74
US6953908B2Oct 11, 2005

Plasma processing apparatus

TOKYO ELECTRON LTD11 citations73
US6823816B2Nov 30, 2004

Plasma processing system

TOKYO ELECTRON LTD10 citations73
US6713968B2Mar 30, 2004

Plasma processing apparatus

TOKYO ELECTRON LTD11 citations73
US6527909B2Mar 4, 2003

Plasma processing apparatus

TOKYO ELECTRON LTD8 citations73
US6452400B1Sep 17, 2002

Method of measuring negative ion density of plasma and plasma processing method and apparatus for carrying out the same

TOKYO ELECTRON LTD7 citations72
US6431114B1Aug 13, 2002

Method and apparatus for plasma processing

TOKYO ELECTRON LTD8 citations72
US7807019B2Oct 5, 2010

Radial antenna and plasma processing apparatus comprising the same

TOKYO ELECTRON LTD4 citations63
US7302910B2Dec 4, 2007

Plasma apparatus and production method thereof

TOKYO ELECTRON LTD3 citations63

RIKAGAKU KENKYUSHO

1 patent
US4749912AJun 7, 1988

Ion-producing apparatus

RIKAGAKU KENKYUSHO40 citations91

GOTO TOSHIO

1 patent
US7632379B2Dec 15, 2009

Plasma source and plasma processing apparatus

GOTO TOSHIO35 citations90

NIHON KOSHUHA CO LTD

1 patent
US6910440B2Jun 28, 2005

Apparatus for plasma processing

NIHON KOSHUHA CO LTD16 citations83

ITO MASAFUMI

1 patent
US7416330B2Aug 26, 2008

Method and apparatus for measuring temperature of substrate

ITO MASAFUMI8 citations71

UNIV ELECTRO COMMUNICATIONS

1 patent
US7457721B2Nov 25, 2008

Method and apparatus for measuring small displacement

UNIV ELECTRO COMMUNICATIONS2 citations63

Showing the top 50 of 67 patents by PatentIndex Score.