Inventor
ENDO SHOSUKE
JP8 patents
Patents
8 patentsUS6544380B2Apr 8, 2003
Plasma treatment method and apparatus
TOKYO ELECTRON LTD104 citations98
US6074518AJun 13, 2000
Plasma processing apparatus
TOKYO ELECTRON LTD276 citations98
US6035804AMar 14, 2000
Process chamber apparatus
TOKYO ELECTRON LTD452 citations98
USD411516SJun 29, 1999
Gas diffusion plate for electrode of semiconductor wafer processing apparatus
TOKYO ELECTRON LTD469 citations98
US5698062ADec 16, 1997
Plasma treatment apparatus and method
TOKYO ELECTRON LTD161 citations98
US7337745B1Mar 4, 2008
Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor
TOKYO ELECTRON LTD83 citations97
US6106737AAug 22, 2000
Plasma treatment method utilizing an amplitude-modulated high frequency power
TOKYO ELECTRON LTD66 citations96
US6391147B2May 21, 2002
Plasma treatment method and apparatus
TOKYO ELECTRON LTD49 citations92