Inventor
AKIMOTO MASAMI
JP105 patents
Patents
50 patentsUS6416583B1Jul 9, 2002
Film forming apparatus and film forming method
TOKYO ELECTRON LTD128 citations99
US6074154AJun 13, 2000
Substrate treatment system, substrate transfer system, and substrate transfer method
TOKYO ELECTRON LTD457 citations99
US5826129AOct 20, 1998
Substrate processing system
TOKYO ELECTRON LTD552 citations99
US5442416AAug 15, 1995
Resist processing method
TOKYO ELECTRON LTD138 citations99
US5361449ANov 8, 1994
Cleaning apparatus for cleaning reverse surface of semiconductor wafer
TOKYO ELECTRON LTD165 citations99
US5202716AApr 13, 1993
Resist process system
TOKYO ELECTRON LTD146 citations99
US5061144AOct 29, 1991
Resist process apparatus
TOKYO ELECTRON LTD183 citations99
US4985722AJan 15, 1991
Apparatus for coating a photo-resist film and/or developing it after being exposed
TOKYO ELECTRON LTD144 citations99
US6627263B2Sep 30, 2003
Film forming apparatus and film forming method
TOKYO ELECTRON LTD95 citations98
US6097005AAug 1, 2000
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD89 citations98
US6004047ADec 21, 1999
Method of and apparatus for processing photoresist, method of evaluating photoresist film, and processing apparatus using the evaluation method
TOKYO ELECTRON LTD127 citations98
US5711646AJan 27, 1998
Substrate transfer apparatus
TOKYO ELECTRON LTD128 citations98
US5460478AOct 24, 1995
Method for processing wafer-shaped substrates
TOKYO ELECTRON LTD123 citations98
US6676757B2Jan 13, 2004
Coating film forming apparatus and coating unit
TOKYO ELECTRON LTD60 citations96
US6464789B1Oct 15, 2002
Substrate processing apparatus
TOKYO ELECTRON LTD56 citations96
US6425722B1Jul 30, 2002
Substrate treatment system, substrate transfer system, and substrate transfer method
TOKYO ELECTRON LTD54 citations96
US6383948B1May 7, 2002
Coating film forming apparatus and coating film forming method
TOKYO ELECTRON LTD57 citations96
US6371667B1Apr 16, 2002
Film forming method and film forming apparatus
TOKYO ELECTRON LTD76 citations96
US6190063B1Feb 20, 2001
Developing method and apparatus
TOKYO ELECTRON LTD63 citations96
US5974682ANov 2, 1999
Cooling process system
TOKYO ELECTRON LTD85 citations96
US5972110AOct 26, 1999
Resist processing system
TOKYO ELECTRON LTD86 citations96
US5942013AAug 24, 1999
Substrate processing system
TOKYO ELECTRON LTD55 citations96
US5938847AAug 17, 1999
Method and apparatus for coating a film on an object being processed
TOKYO ELECTRON LTD58 citations96
US5937223AAug 10, 1999
Processing apparatus
TOKYO ELECTRON LTD62 citations96
US5858112AJan 12, 1999
Method for cleaning substrates
TOKYO ELECTRON LTD46 citations96
US5772764AJun 30, 1998
Coating apparatus
TOKYO ELECTRON LTD93 citations96
US5651160AJul 29, 1997
Cleaning apparatus for cleaning substrates
TOKYO ELECTRON LTD73 citations96
US5626675AMay 6, 1997
Resist processing apparatus, substrate processing apparatus and method of transferring a processed article
TOKYO ELECTRON LTD64 citations96
US5620560AApr 15, 1997
Method and apparatus for heat-treating substrate
TOKYO ELECTRON LTD70 citations96
US5364222ANov 15, 1994
Apparatus for processing wafer-shaped substrates
TOKYO ELECTRON LTD107 citations96
US5339128AAug 16, 1994
Resist processing method
TOKYO ELECTRON LTD81 citations96
US5297910AMar 29, 1994
Transportation-transfer device for an object of treatment
TOKYO ELECTRON LTD70 citations96
US5250114AOct 5, 1993
Coating apparatus with nozzle moving means
TOKYO ELECTRON LTD61 citations96
US5177514AJan 5, 1993
Apparatus for coating a photo-resist film and/or developing it after being exposed
TOKYO ELECTRON LTD75 citations96
US5089305AFeb 18, 1992
Coating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by state
TOKYO ELECTRON LTD74 citations96
US5002008AMar 26, 1991
Coating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by state
TOKYO ELECTRON LTD115 citations96
US5980591ANov 9, 1999
System for processing a plurality of objects contained in a plurality of cassettes
TOKYO ELECTRON LTD56 citations95
US5844662ADec 1, 1998
Resist processing apparatus and a resist processing method
TOKYO ELECTRON LTD67 citations95
US5803932ASep 8, 1998
Resist processing apparatus having an interface section including two stacked substrate waiting tables
TOKYO ELECTRON LTD84 citations95
US5405443AApr 11, 1995
Substrates processing device
TOKYO ELECTRON LTD63 citations95
US5312487AMay 17, 1994
Coating apparatus
TOKYO ELECTRON LTD85 citations95
US7322756B2Jan 29, 2008
Coating and developing apparatus and coating and developing method
TOKYO ELECTRON LTD33 citations93
US7281869B2Oct 16, 2007
Coating and developing system and coating and developing method
TOKYO ELECTRON LTD30 citations93
US7267497B2Sep 11, 2007
Coating and developing system and coating and developing method
TOKYO ELECTRON LTD29 citations93
US7241061B2Jul 10, 2007
Coating and developing system and coating and developing method
TOKYO ELECTRON LTD34 citations93
US6515731B1Feb 4, 2003
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD40 citations93
US6475279B1Nov 5, 2002
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD18 citations93
US6027262AFeb 22, 2000
Resist process method and system
TOKYO ELECTRON LTD36 citations93
US5868865AFeb 9, 1999
Apparatus and method for washing treatment
TOKYO ELECTRON LTD33 citations93
USD341418SNov 16, 1993
Supply nozzle for applying liquid resist to a semiconductor wafer
TOKYO ELECTRON LTD24 citations93
Showing the top 50 of 105 patents by PatentIndex Score.