Inventor
SEMBA NORIO
JP15 patents
Patents
15 patentsUS5826129AOct 20, 1998
Substrate processing system
TOKYO ELECTRON LTD552 citations99
US6033475AMar 7, 2000
Resist processing apparatus
TOKYO ELECTRON LTD90 citations97
US5938847AAug 17, 1999
Method and apparatus for coating a film on an object being processed
TOKYO ELECTRON LTD58 citations96
US5854953ADec 29, 1998
Method for developing treatment
TOKYO ELECTRON LTD58 citations96
US6333003B1Dec 25, 2001
Treatment apparatus, treatment method, and impurity removing apparatus
TOKYO ELECTRON LTD39 citations92
US6268013B1Jul 31, 2001
Coating a resist film, with pretesting for particle contamination
TOKYO ELECTRON LTD24 citations92
US6133981AOct 17, 2000
Processing system
TOKYO ELECTRON LTD20 citations92
US6063439AMay 16, 2000
Processing apparatus and method using solution
TOKYO ELECTRON LTD45 citations92
US6015066AJan 18, 2000
Liquid supplying device
TOKYO ELECTRON LTD44 citations92
US5944894AAug 31, 1999
Substrate treatment system
TOKYO ELECTRON LTD54 citations92
US6368776B1Apr 9, 2002
Treatment apparatus and treatment method
TOKYO ELECTRON LTD36 citations91
US5866307AFeb 2, 1999
Resist processing method and resist processing system
TOKYO ELECTRON LTD34 citations91
US6332724B1Dec 25, 2001
Substrate processing apparatus
TOKYO ELECTRON LTD24 citations90
US6217657B1Apr 17, 2001
Resist processing system having process solution deaeration mechanism
TOKYO ELECTRON LTD28 citations87
US6338474B1Jan 15, 2002
Air feeder provided with by-pass bypassing cooling section, substrate processing apparatus including the same, and air supply method
TOKYO ELECTRON LTD13 citations73