Inventor
OKORN-SCHMIDT HARALD F
US16 patents
Patents
16 patentsUS6444592B1Sep 3, 2002
Interfacial oxidation process for high-k gate dielectric process integration
IBM191 citations98
US6276370B1Aug 21, 2001
Sonic cleaning with an interference signal
IBM90 citations97
US6511873B2Jan 28, 2003
High-dielectric constant insulators for FEOL capacitors
IBM38 citations96
US6200891B1Mar 13, 2001
Removal of dielectric oxides
IBM54 citations96
US6254796B1Jul 3, 2001
Selective etching of silicate
IBM24 citations92
US6191085B1Feb 20, 2001
Method for cleaning semiconductor devices
IBM17 citations92
US6150282ANov 21, 2000
Selective removal of etching residues
IBM25 citations92
US6117796ASep 12, 2000
Removal of silicon oxide
IBM23 citations92
US6066267AMay 23, 2000
Etching of silicon nitride
IBM24 citations92
US6033996AMar 7, 2000
Process for removing etching residues, etching mask and silicon nitride and/or silicon dioxide
IBM48 citations92
US5965465AOct 12, 1999
Etching of silicon nitride
IBM28 citations92
US5962384AOct 5, 1999
Method for cleaning semiconductor devices
IBM40 citations92
US6667207B2Dec 23, 2003
High-dielectric constant insulators for FEOL capacitors
IBM12 citations74
US6354309B1Mar 12, 2002
Process for treating a semiconductor substrate
IBM13 citations69
US6173720B1Jan 16, 2001
Process for treating a semiconductor substrate
IBM7 citations69
US6958506B2Oct 25, 2005
High-dielectric constant insulators for feol capacitors
IBM3 citations63