Inventor

ASHIZAWA TORANOSUKE

JP25 patents

⚠️ This page may combine multiple inventors who share the name “ASHIZAWA TORANOSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASHIZAWA TORANOSUKE

HITACHI CHEMICAL CO LTD

Cerium oxide abrasive and method of polishing substrates

Cerium oxide abrasive and method of polishing substrates

Abrasive, method of polishing wafer, and method of producing semiconductor device

CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate

Method for producing cerium oxide, cerium oxide abrasive, method for polishing substrate using the same and method for manufacturing semiconductor device

CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive

Abrasive compound for CMP, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive compound

Process for producing zirconium oxide sintered body

Cerium oxide abrasive and method of polishing substrates

Abrasive, method of polishing target member and process for producing semiconductor device

Process for preparing phosphor pattern, phosphor pattern prepared the same and back plate for plasma display panel

CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate

Fluorescent pattern, process for preparing the same, organic alkali developing solution for forming the same, emulsion developing solution for forming the same and back plate for plasma display using the same

Superconducting thick film circuit board, production thereof, thick film superconductor and production thereof

Abrasive, method of polishing target member and process for producing semiconductor device

Abrasive, method of polishing target member and process for producing semiconductor device

Fluorescent pattern, process for preparing the same, organic alkali developing solution for forming the same, emulsion developing solution for forming the same and back plate for plasma display using the same

Bi-Pb-Sr-Mg-Ba-Ca-Cu-O oxide superconductors and production thereof

Oxide superconductor Bi--Sr--Ca--Mg--Ba--Cu--O

Polishing slurry for polishing aluminum film and polishing method for polishing aluminum film using the same

Cerium oxide abrasive and method of polishing substrates

YOSHIDA MASATO

Abrasive, method of polishing target member and process for producing semiconductor device

Abrasive, method of polishing target member and process for producing semiconductor device

Abrasive, method of polishing target member and process for producing semiconductor device

KOYAMA NAOYUKI

Polishing slurry and polishing method