Inventor
OGASAWARA MAKOTO
JP38 patents
⚠️ This page may combine multiple inventors who share the name “OGASAWARA MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
17 patentsUS5780882AJul 14, 1998
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD33 citations96
US5331191AJul 19, 1994
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD24 citations96
US5202275AApr 13, 1993
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD43 citations96
US4974060ANov 27, 1990
Semiconductor integrated circuit device and method of manufacturing the same
HITACHI LTD62 citations96
US6620704B2Sep 16, 2003
Method of fabricating low stress semiconductor devices with thermal oxide isolation
HITACHI LTD13 citations92
US6291847B1Sep 18, 2001
Semiconductor integrated circuit device and process for manufacturing the same
HITACHI LTD30 citations92
US6548847B2Apr 15, 2003
Semiconductor integrated circuit device having a first wiring strip exposed through a connecting hole, a transition-metal film in the connecting hole and an aluminum wiring strip thereover, and a transition-metal nitride film between the aluminum wiring strip and the transition-metal film
HITACHI LTD12 citations82
US6342412B1Jan 29, 2002
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD8 citations82
US6169324B1Jan 2, 2001
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD13 citations82
US6127255AOct 3, 2000
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD8 citations82
US5811316ASep 22, 1998
Method of forming teos oxide and silicon nitride passivation layer on aluminum wiring
HITACHI LTD8 citations82
US5739589AApr 14, 1998
Semiconductor integrated circuit device process for fabricating the same and apparatus for fabricating the same
HITACHI LTD13 citations82
US5557147ASep 17, 1996
Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
HITACHI LTD7 citations74
US5889312AMar 30, 1999
Semiconductor device having circuit element in stress gradient region by film for isolation and method of manufacturing the same
HITACHI LTD6 citations71
US6573546B2Jun 3, 2003
Semiconductor integrated circuit device and process for manufacturing the same
HITACHI LTD2 citations63
US6310384B1Oct 30, 2001
Low stress semiconductor devices with thermal oxide isolation
HITACHI LTD2 citations63
US6949387B2Sep 27, 2005
Method of designing a semiconductor device
HITACHI LTD0 citations52
TEIJIN LTD
8 patentsUS4331697AMay 25, 1982
Novel heparin derivative, method for production thereof, and method for rendering biomedical materials antithrombotic by use of the novel heparin derivative
TEIJIN LTD88 citations96
US4269947AMay 26, 1981
Cured or uncured aromatic polyester composition and process for its production
TEIJIN LTD51 citations90
US4333907AJun 8, 1982
Biaxially oriented wholly aromatic polyester film
TEIJIN LTD25 citations82
US4291152ASep 22, 1981
Process for producing aromatic polyesters having increased degrees of polymerization
TEIJIN LTD27 citations82
US4369207AJan 18, 1983
Process for production of laminated film structure of aromatic polyester
TEIJIN LTD9 citations74
US4331800AMay 25, 1982
Process for producing aromatic polyesters having an increased degree of polymerization
TEIJIN LTD18 citations74
US4292151ASep 29, 1981
Process for preparing a cured copolyetherester elastomeric composition
TEIJIN LTD16 citations73
US4196066AApr 1, 1980
Cured aromatic polyester composition and process for its production
TEIJIN LTD9 citations71
RENESAS ELECTRONICS CORP
3 patentsUS10211620B2Feb 19, 2019
Semiconductor device
RENESAS ELECTRONICS CORP0 citations50
US10651094B2May 12, 2020
Semiconductor device and method of manufacturing same
RENESAS ELECTRONICS CORP0 citations41
US10438861B2Oct 8, 2019
Semiconductor device and method for manufacturing the same
RENESAS ELECTRONICS CORP0 citations40