Inventor

TZENG HUEY-MING

US26 patents

⚠️ This page may combine multiple inventors who share the name “TZENG HUEY-MING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TZENG HUEY-MING

HITACHI GLOBAL STORAGE TECH

Method of providing a low-stress sensor configuration for a lithography-defined read sensor

Electrical lapping guide embedded in a shield of a magnetic head

Slider having integrated lapping guides

Pattern-electroplated lapping plates for reduced loads during single slider lapping and process for their fabrication

Method for reducing damage to sliders during lapping

In-line contiguous resistive lapping guide for magnetic sensors

Critically exposed lapping of magnetic sensors for target signal output

Method of forming an embedded read element

Storage device slider with sacrificial lapping extension

Methods of manufacturing sliders

Storage device slider with sacrificial lapping extension

Method of achieving very high crown-to-camber ratios on magnetic sliders

System and apparatus for achieving very high crown-to-camber ratios on magnetic sliders

Method of fabrication of magnetic head having annealed embedded read sensor

Method of making a read sensor while protecting it from electrostatic discharge (ESD) damage

Storage device having slider with sacrificial extension aligned with channel on opposite surface

Method of predicting plate lapping properties to improve slider fabrication yield

System and apparatus for predicting plate lapping properties to improve slider fabrication yield

Process for the fabrication of multilayer thin film magnetoresistive sensors

IBM

Actuator arm with cutouts and means for filling or blocking the cutouts

Power-saving high performance data storage system

DAI QING

System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules

System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules

APLEX GROUP

In-situ monitoring of polishing pad wear

FONTANA JR ROBERT E

Distributed shunt structure for lapping of current perpendicular plane (CPP) heads

BOONE JR THOMAS D

Controlled lapping for an ABS damascene process