Inventor
REN ZHIBIN
US47 patents
⚠️ This page may combine multiple inventors who share the name “REN ZHIBIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
29 patentsUS7459752B2Dec 2, 2008
Ultra thin body fully-depleted SOI MOSFETs
IBM283 citations99
US7002214B1Feb 21, 2006
Ultra-thin body super-steep retrograde well (SSRW) FET devices
IBM160 citations99
US8043920B2Oct 25, 2011
finFETS and methods of making same
IBM91 citations97
US7968459B2Jun 28, 2011
Ion implantation combined with in situ or ex situ heat treatment for improved field effect transistors
IBM104 citations96
US8575699B2Nov 5, 2013
Thin box metal backgate extremely thin SOI device
IBM17 citations93
US7955928B2Jun 7, 2011
Structure and method of fabricating FinFET
IBM32 citations93
US7183613B1Feb 27, 2007
Method and structure for enhancing both NMOSFET and PMOSFET performance with a stressed film
IBM22 citations93
US7091069B2Aug 15, 2006
Ultra thin body fully-depleted SOI MOSFETs
IBM32 citations93
US8012820B2Sep 6, 2011
Ultra-thin SOI CMOS with raised epitaxial source and drain and embedded SiGe PFET extension
IBM38 citations92
US7704839B2Apr 27, 2010
Buried stress isolation for high-performance CMOS technology
IBM8 citations84
US7384851B2Jun 10, 2008
Buried stress isolation for high-performance CMOS technology
IBM11 citations84
US7993995B2Aug 9, 2011
Metal-gated MOSFET devices having scaled gate stack thickness including gettering species in a buried oxide
IBM7 citations83
US7648868B2Jan 19, 2010
Metal-gated MOSFET devices having scaled gate stack thickness
IBM15 citations83
US7374998B2May 20, 2008
Selective incorporation of charge for transistor channels
IBM11 citations80
US7989297B2Aug 2, 2011
Asymmetric epitaxy and application thereof
IBM5 citations74
US7326997B2Feb 5, 2008
Method and structure for enhancing both nMOSFET and pMOSFET performance with a stressed film
IBM5 citations74
US7396776B2Jul 8, 2008
Semiconductor-on-insulator (SOI) structures including gradient nitrided buried oxide (BOX)
IBM7 citations73
US7955950B2Jun 7, 2011
Semiconductor-on-insulator substrate with a diffusion barrier
IBM2 citations63
US7494886B2Feb 24, 2009
Uniaxial strain relaxation of biaxial-strained thin films using ion implantation
IBM3 citations63
US7476579B2Jan 13, 2009
Method and structure for enhancing both nMOSFET and pMOSFET performance with a stressed film
IBM3 citations63
US11556763B2Jan 17, 2023
Multi-kernel configuration for convolutional neural networks
IBM0 citations62
US8546920B2Oct 1, 2013
Semiconductor-on-insulator (SOI) structures including gradient nitrided buried oxide (BOX)
IBM2 citations62
US7659583B2Feb 9, 2010
Ultrathin SOI CMOS devices employing differential STI liners
IBM4 citations62
US11250316B2Feb 15, 2022
Aggregate adjustments in a cross bar neural network
IBM0 citations52
US8053373B2Nov 8, 2011
Semiconductor-on-insulator(SOI) structures including gradient nitrided buried oxide (BOX)
IBM0 citations52
US8021956B2Sep 20, 2011
Ultrathin SOI CMOS devices employing differential STI liners
IBM1 citations52
US11537863B2Dec 27, 2022
Resistive processing unit cell having multiple weight update and read circuits for parallel processing of data using shared weight value
IBM0 citations51
US7687863B2Mar 30, 2010
Selective incorporation of charge for transistor channels
IBM0 citations48
US7776624B2Aug 17, 2010
Method for improving semiconductor surfaces
IBM0 citations36
CHAN KEVIN K
4 patentsUS8946028B2Feb 3, 2015
Merged FinFETs and method of manufacturing the same
CHAN KEVIN K8 citations84
US8431994B2Apr 30, 2013
Thin-BOX metal backgate extremely thin SOI device
CHAN KEVIN K6 citations84
US8410544B2Apr 2, 2013
finFETs and methods of making same
CHAN KEVIN K10 citations83
US8765532B2Jul 1, 2014
Fabrication of field effect devices using spacers
CHAN KEVIN K0 citations42
CAI JIN
2 patentsUS8314463B2Nov 20, 2012
Method for fabricating super-steep retrograde well MOSFET on SOI or bulk silicon substrate, and device fabricated in accordance with the method
CAI JIN9 citations84
US8329564B2Dec 11, 2012
Method for fabricating super-steep retrograde well MOSFET on SOI or bulk silicon substrate, and device fabricated in accordance with the method
CAI JIN5 citations63