Inventor
TAKEDA TSUYOSHI
JP69 patents
⚠️ This page may combine multiple inventors who share the name “TAKEDA TSUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOKUSAI ELECTRIC CORP
17 patentsUS11629408B2Apr 18, 2023
Plasma generation device, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP8 citations86
US11469081B2Oct 11, 2022
Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP4 citations84
US11469083B2Oct 11, 2022
Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP4 citations84
US12094735B2Sep 17, 2024
Substrate processing apparatus, plurality of electrodes and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations73
US11967490B2Apr 23, 2024
Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations73
US11749510B2Sep 5, 2023
Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations73
US11037823B2Jun 15, 2021
Method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations63
US12492476B2Dec 9, 2025
Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and plasma generation device preliminary
KOKUSAI ELECTRIC CORP0 citations62
US12463017B2Nov 4, 2025
Substrate processing apparatus, plasma light emitting apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US12400840B2Aug 26, 2025
Substrate processing apparatus, substrate holder, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US12068136B2Aug 20, 2024
Substrate processing apparatus, method of manufacturing semiconductor device, and plasma generator
KOKUSAI ELECTRIC CORP1 citations62
US11961715B2Apr 16, 2024
Substrate processing apparatus, substrate retainer and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US11804365B2Oct 31, 2023
Substrate processing apparatus, plasma generating apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP1 citations62
US11380563B2Jul 5, 2022
Substrate processing apparatus, plurality of electrodes and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP1 citations62
US12488962B2Dec 2, 2025
Substrate processing apparatus, plasma generating apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations61
US10796934B2Oct 6, 2020
Substrate processing apparatus, method of manufacturing semiconductor device and electrode fixing part
KOKUSAI ELECTRIC CORP1 citations61
US11295959B2Apr 5, 2022
Method of determining plasma abnormality, method of manufacturing semiconductor device, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations60
HITACHI INT ELECTRIC INC
17 patentsUS8846546B2Sep 30, 2014
Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus and recording medium
HITACHI INT ELECTRIC INC14 citations84
US10153132B2Dec 11, 2018
Substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations73
US9698050B1Jul 4, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC3 citations73
US9607908B1Mar 28, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC3 citations73
US9337015B2May 10, 2016
Method of manufacturing a semiconductor device, method of processing a substrate, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC5 citations68
US9745656B2Aug 29, 2017
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and computer-readable recording medium
HITACHI INT ELECTRIC INC1 citations63
US9406520B2Aug 2, 2016
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and computer-readable recording medium
HITACHI INT ELECTRIC INC1 citations63
US9378964B2Jun 28, 2016
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and computer-readable recording medium
HITACHI INT ELECTRIC INC1 citations63
US9355850B2May 31, 2016
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and computer-readable recording medium
HITACHI INT ELECTRIC INC1 citations63
US9184046B2Nov 10, 2015
Semiconductor device manufacturing and processing methods and apparatuses for forming a film
HITACHI INT ELECTRIC INC2 citations63
US9012323B2Apr 21, 2015
Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and computer-readable recording medium
HITACHI INT ELECTRIC INC2 citations63
US10679831B2Jun 9, 2020
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC1 citations62
US11072859B2Jul 27, 2021
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
HITACHI INT ELECTRIC INC0 citations52
US10128128B2Nov 13, 2018
Method of manufacturing semiconductor device having air gap between wirings for low dielectric constant
HITACHI INT ELECTRIC INC1 citations52
US9559022B1Jan 31, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations52
US10896810B2Jan 19, 2021
RF generating apparatus and plasma treatment apparatus
HITACHI INT ELECTRIC INC0 citations50
US9831083B2Nov 28, 2017
Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC0 citations50
PANASONIC CORP
5 patentsUS9351402B2May 24, 2016
Circuit board, and semiconductor device having component mounted on circuit board
PANASONIC CORP4 citations72
US9070393B2Jun 30, 2015
Three-dimensional structure in which wiring is provided on its surface
PANASONIC CORP6 citations72
US9082438B2Jul 14, 2015
Three-dimensional structure for wiring formation
PANASONIC CORP2 citations62
US9332642B2May 3, 2016
Circuit board
PANASONIC CORP0 citations51
US9082825B2Jul 14, 2015
Manufacturing method for semiconductor package, semiconductor package, and semiconductor device
PANASONIC CORP1 citations51
Kk saginomiya seisakusho
3 patentsSAGINOMIYA SEISAKUSHO INC
2 patentsTAKEDA TSUYOSHI
2 patentsOGAWA ARITO
1 patentYOSHIOKA SHINGO
1 patentKONISHIROKU PHOTO IND
1 patentTEIJIN LTD
1 patentShowing the top 50 of 69 patents by PatentIndex Score.