Inventor
TOMITA TADATOSHI
JP13 patents
Patents
13 patentsUS9418860B2Aug 16, 2016
Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
TOKYO ELECTRON LTD12 citations91
US10418242B2Sep 17, 2019
Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers
TOKYO ELECTRON LTD2 citations71
US11574812B2Feb 7, 2023
Computer storage medium to perform a substrate treatment method using a block copolymer containing a hydrophilic and hydrophobic copolymers
TOKYO ELECTRON LTD0 citations61
US10121659B2Nov 6, 2018
Pattern forming method and heating apparatus
TOKYO ELECTRON LTD0 citations51
US9859118B2Jan 2, 2018
Pattern forming method and heating apparatus
TOKYO ELECTRON LTD0 citations51
US9618849B2Apr 11, 2017
Pattern forming method, pattern forming apparatus, and computer readable storage medium
TOKYO ELECTRON LTD1 citations51
US9810987B2Nov 7, 2017
Substrate treatment method, computer storage medium and substrate treatment system
TOKYO ELECTRON LTD0 citations41
US9741583B2Aug 22, 2017
Substrate treatment method, computer readable storage medium and substrate treatment system
TOKYO ELECTRON LTD0 citations41
US9530645B2Dec 27, 2016
Pattern forming method, pattern forming apparatus, and non-transitory computer-readable storage medium
TOKYO ELECTRON LTD0 citations41
US10586711B2Mar 10, 2020
Substrate processing method and computer storage medium
TOKYO ELECTRON LTD0 citations40
US10329144B2Jun 25, 2019
Substrate treatment method, computer storage medium and substrate treatment system
TOKYO ELECTRON LTD0 citations40
US9748101B2Aug 29, 2017
Substrate treatment method, computer storage medium, and substrate treatment system
TOKYO ELECTRON LTD0 citations39
US8367308B2Feb 5, 2013
Substrate processing method
TOKYO ELECTRON LTD0 citations37