Inventor
TANOUCHI KEIJI
JP13 patents
Patents
13 patentsUS9953826B2Apr 24, 2018
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD15 citations92
US7976896B2Jul 12, 2011
Method of processing a substrate and apparatus processing the same
TOKYO ELECTRON LTD9 citations83
US11367630B2Jun 21, 2022
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD3 citations72
US10811283B2Oct 20, 2020
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD2 citations72
US10043652B2Aug 7, 2018
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD5 citations72
US9881784B2Jan 30, 2018
Substrate processing method, substrate processing apparatus, and storage medium
TOKYO ELECTRON LTD4 citations72
US12500091B2Dec 16, 2025
Etching method, method of removing etching residue, and storage medium
TOKYO ELECTRON LTD0 citations62
US10121659B2Nov 6, 2018
Pattern forming method and heating apparatus
TOKYO ELECTRON LTD0 citations51
US9859118B2Jan 2, 2018
Pattern forming method and heating apparatus
TOKYO ELECTRON LTD0 citations51
US9618849B2Apr 11, 2017
Pattern forming method, pattern forming apparatus, and computer readable storage medium
TOKYO ELECTRON LTD1 citations51
US7781342B2Aug 24, 2010
Substrate treatment method for etching a base film using a resist pattern
TOKYO ELECTRON LTD0 citations51
US9530645B2Dec 27, 2016
Pattern forming method, pattern forming apparatus, and non-transitory computer-readable storage medium
TOKYO ELECTRON LTD0 citations41
US9748101B2Aug 29, 2017
Substrate treatment method, computer storage medium, and substrate treatment system
TOKYO ELECTRON LTD0 citations39