Inventor

OLSEN CHRISTOPHER S

US69 patents

⚠️ This page may combine multiple inventors who share the name “OLSEN CHRISTOPHER S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OLSEN CHRISTOPHER S

APPLIED MATERIALS INC

Trench fill process for reducing stress in shallow trench isolation

Silicon oxynitride gate dielectric formation using multiple annealing steps

Method of forming dielectric layers on a substrate and apparatus therefor

Cleaning method

Remote plasma radical treatment of silicon oxide

Method for improving nitrogen profile in plasma nitrided gate dielectric layers

Cleaning method

Gas injection apparatus and substrate process chamber incorporating same

Method of selective nitridation

Method and apparatus for precleaning a substrate surface prior to epitaxial growth

Method and apparatus for supplying improved gas flow to a processing volume of a processing chamber

Manufacturing method for two-step post nitridation annealing of plasma nitrided gate dielectric

Method of linearized film oxidation growth

Asymmetric injection for better wafer uniformity

Method and apparatus for selective nitridation process

Dogbone inlet cone profile for remote plasma oxidation chamber

Asymmetric injection for better wafer uniformity

Cleaning method

Chamber inlet

Dogbone inlet cone profile for remote plasma oxidation chamber

Side inject designs for improved radical concentrations

Dogbone inlet cone profile for remote plasma oxidation chamber

Cleaning method

Methods for conformal treatment of dielectric films with low thermal budget

Methods and apparatus for selective oxidation of a substrate

Steam oxidation initiation for high aspect ratio conformal radical oxidation

Growth of thin oxide layer with amorphous silicon and oxidation

Steam oxidation initiation for high aspect ratio conformal radical oxidation

Remote plasma radical treatment of silicon oxide

Method and apparatus for selective nitridation process

Dual frequency low temperature oxidation of a semiconductor device

Dual pressure oxidation method for forming an oxide layer in a feature

Method of linearized film oxidation growth

Chamber inlet

Gas injector with baffle

Side inject designs for improved radical concentrations

Gas injector with baffle

Methods for conformal treatment of dielectric films with low thermal budget

Conformal oxidation processes for 3D NAND

Argon addition to remote plasma oxidation

Method and apparatus for selective nitridation process

Argon addition to remote plasma oxidation

Growth of thin oxide layer with silicon nitride and conversion

PHILIPS ELECTRONICS NA

Method for determining nitrogen concentration in a film of nitrided oxide material

VLSI TECHNOLOGY INC

Trench-diffusion corner rounding in a shallow-trench (STI) process

LIU WEI

NH3 containing plasma nitridation of a layer on a substrate

YOKOTA YOSHITAKA

Methods of forming oxide layers on substrates

BORDEN PETER

Passivation process for solar cell fabrication

GANGULY UDAYAN

Multi-layer charge trap silicon nitride/oxynitride layer engineering with interface region control

APPLIED MAT INC

Method and apparatus for supplying improved gas flow to a processing volume of a processing chamber