P

Inventor

TANG FU

CN35 patents
⚠️ This page may combine multiple inventors who share the name “TANG FU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASM IP HOLDING BV

26 patents
US9905492B2Feb 27, 2018

System and method for gas-phase passivation of a semiconductor surface

ASM IP HOLDING BV361 citations99
US9558931B2Jan 31, 2017

System and method for gas-phase sulfur passivation of a semiconductor surface

ASM IP HOLDING BV478 citations99
US9245742B2Jan 26, 2016

Sulfur-containing thin films

ASM IP HOLDING BV476 citations99
US10410943B2Sep 10, 2019

Method for passivating a surface of a semiconductor and related systems

ASM IP HOLDING BV339 citations98
US10367080B2Jul 30, 2019

Method of forming a germanium oxynitride film

ASM IP HOLDING BV375 citations98
US9911676B2Mar 6, 2018

System and method for gas-phase passivation of a semiconductor surface

ASM IP HOLDING BV464 citations98
US9711396B2Jul 18, 2017

Method for forming metal chalcogenide thin films on a semiconductor device

ASM IP HOLDING BV7 citations84
US9478419B2Oct 25, 2016

Sulfur-containing thin films

ASM IP HOLDING BV7 citations84
US9461134B1Oct 4, 2016

Method for forming source/drain contact structure with chalcogen passivation

ASM IP HOLDING BV12 citations84
US11798999B2Oct 24, 2023

Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures

ASM IP HOLDING BV1 citations73
US11101370B2Aug 24, 2021

Method of forming a germanium oxynitride film

ASM IP HOLDING BV2 citations73
US10199213B2Feb 5, 2019

Sulfur-containing thin films

ASM IP HOLDING BV2 citations73
US9741815B2Aug 22, 2017

Metal selenide and metal telluride thin films for semiconductor device applications

ASM IP HOLDING BV5 citations73
US12525451B2Jan 13, 2026

Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures

ASM IP HOLDING BV0 citations62
US12094936B2Sep 17, 2024

Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures

ASM IP HOLDING BV0 citations62
US11923192B2Mar 5, 2024

Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures

ASM IP HOLDING BV0 citations62
US11469098B2Oct 11, 2022

Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures

ASM IP HOLDING BV0 citations62
US11411088B2Aug 9, 2022

Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures

ASM IP HOLDING BV0 citations62
US12295163B2May 6, 2025

Formation of gate stacks comprising a threshold voltage tuning layer

ASM IP HOLDING BV1 citations60
US10854444B2Dec 1, 2020

Sulfur-containing thin films

ASM IP HOLDING BV0 citations52
US10818758B2Oct 27, 2020

Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures

ASM IP HOLDING BV0 citations52
US10553424B2Feb 4, 2020

Sulfur-containing thin films

ASM IP HOLDING BV0 citations52
US10490475B2Nov 26, 2019

Methods for semiconductor passivation by nitridation after oxide removal

ASM IP HOLDING BV0 citations52
US9721786B2Aug 1, 2017

Sulfur-containing thin films

ASM IP HOLDING BV0 citations52
US9711350B2Jul 18, 2017

Methods for semiconductor passivation by nitridation

ASM IP HOLDING BV0 citations52
US12378667B2Aug 5, 2025

Methods and systems for forming doped silicon nitride films

ASM IP HOLDING BV0 citations43

SHENZHEN BYD AUTO R&D CO LTD

4 patents

LU TOH-MING

2 patents

BYD CO LTD

1 patent

RENSSELAER POLYTECH INST

1 patent

HEFEI BOE DISPLAY TECH CO LTD

1 patent